SCHEMBL5837771

SCHEMBL5837771

CCCCOC(=O)CC1(C(=O)O)CC2C=CC1C2

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 5/20 0.36
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
NAAA Q02083 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.32
HTT P42858 1/20 0.32
PRKCA P17252 3/20 0.32
HCAR2 Q8TDS4 1/20 0.31
ATM Q13315 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15611830 0.96 EPHX2 (0.40) EPHX2MEN1KMT2ANAAACYP2D6
SCHEMBL15611567 0.95 NAAA (0.41) EPHX2MEN1KMT2ANAAALMNA
SCHEMBL11755667 0.87 CYP2D6 (0.36) EPHX2KMT2ACYP2D6CYP2C19ALDH1A1
SCHEMBL11759558 0.87 CYP2D6 (0.36) EPHX2KMT2ACYP2D6CYP2C19ALDH1A1
SCHEMBL5837507 0.87 CYP2D6 (0.36) EPHX2KMT2ACYP2D6CYP2C19ALDH1A1
SCHEMBL5836998 0.82 EPHX2 (0.34) EPHX2CYP2D6CYP2C19ALDH1A1LMNA
SCHEMBL5837477 0.82 CYP2D6 (0.33) EPHX2CYP2D6CYP2C19ALDH1A1HCAR2
SCHEMBL5837137 0.81 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL7638350 0.79 CYP2D6 (0.39) CYP2D6CYP2C19
SCHEMBL32688908 0.78 CYP2D6 (0.38) EPHX2CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110366704-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社(JP) 2023-01-13 CN disclosed
CN-111770964-B Resin composition and electronic component 日本瑞翁株式会社 2022-12-02 CN disclosed
CN-108885398-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2022-11-29 CN disclosed
CN-114402258-A Radiation-sensitive resin composition 日本瑞翁株式会社 2022-04-26 CN disclosed
US-11169440-B2 Radiation-sensitive resin composition and electronic component ZEON CORPORATION (JP) 2021-11-09 US disclosed
EP-3345970-B1 RESIN COMPOSITION ZEON CORP (JP) 2021-07-28 EP disclosed
CN-107922742-B Resin composition 日本瑞翁株式会社 2021-01-15 CN disclosed
CN-107207868-B Resin composition, resin film, and electronic component 日本瑞翁株式会社 2020-11-06 CN disclosed
CN-111770964-A Resin composition and electronic component 日本瑞翁株式会社 2020-10-13 CN disclosed
US-10775697-B2 Radiation-sensitive resin composition, resin film, and electronic device ZEON CORPORATION (JP) 2020-09-15 US disclosed
EP-3121652-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT Zeon Corporation (JP) 2017-01-25 EP disclosed
EP-3121651-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT Zeon Corporation (JP) 2017-01-25 EP disclosed
US-20170017155-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2017-01-19 US disclosed
US-20160297181-A1 LAMINATE ZEON CORPORATION (JP) 2016-10-13 US disclosed
US-20160209744-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2016-07-21 US disclosed
US-20160200914-A1 RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2016-07-14 US disclosed
US-20160202607-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2016-07-14 US disclosed
US-20140087136-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD ZEON CORPORATION (JP) 2014-03-27 US disclosed
US-7037993-B2 Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these ZEON CORPORATION (JP) 2006-05-02 US disclosed
US-20050148746-A1 Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these ZEON CORPORATION (JP) 2005-07-07 US disclosed