SCHEMBL5843641

SCHEMBL5843641

CCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C2CCCCC2)c(OCCCC)c1OCCCC

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 10/20 0.35
PPARG P37231 3/20 0.34
PTGES O14684 1/20 0.33
ALOX5 P09917 1/20 0.33
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
FAAH O00519 2/20 0.31
TSHR P16473 1/20 0.31
MAPK1 P28482 1/20 0.31
RECQL P46063 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5844576 0.86 KDM4E (0.37) CNR2PPARGPTGESALOX5KDM4E
SCHEMBL5845432 0.85 ALOX5 (0.41) PPARGPTGESALOX5KDM4EALDH1A1
SCHEMBL5842847 0.85 PTGES (0.39) CNR2PPARGPTGESALOX5KDM4E
SCHEMBL5862518 0.84 MEN1 (0.45) PPARGPTGESALOX5KDM4EALDH1A1
SCHEMBL5843699 0.83 S1PR3 (0.39) KDM4EALDH1A1LMNAMAPTNPSR1
SCHEMBL5861582 0.82 ALDH1A1 (0.39) PPARGPTGESALOX5KDM4EALDH1A1
SCHEMBL5845019 0.82 S1PR3 (0.41) ALDH1A1LMNAMAPT
SCHEMBL5844215 0.82 S1PR3 (0.41) ALDH1A1LMNAMAPT
SCHEMBL5844229 0.82 S1PR3 (0.41) ALDH1A1LMNAMAPT
SCHEMBL5844555 0.82 S1PR3 (0.41) ALDH1A1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 CNR2 2818/4885PPARG 437/4885PTGES 4108/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.