SCHEMBL5844409

SCHEMBL5844409

CCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])C(=O)c2ccccc2)c(OCCCC)c1OCCCC

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.37
CES1 P23141 3/20 0.37
WDR5 P61964 3/20 0.37
PPARG P37231 2/20 0.36
PTGES O14684 2/20 0.36
ALOX5 P09917 2/20 0.36
PTPN11 Q06124 1/20 0.35
KAT6A Q92794 1/20 0.35
SLC2A1 P11166 1/20 0.35
PPARD Q03181 1/20 0.35
PPARA Q07869 1/20 0.35
FABP4 P15090 1/20 0.35
FABP5 Q01469 1/20 0.35
GAA P10253 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
S1PR3 Q99500 1/20 0.34
CNR1 P21554 1/20 0.34
CNR2 P34972 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5862526 0.85 WDR5 (0.40) CES2CES1WDR5PPARGPTGES
SCHEMBL5844389 0.84 S1PR3 (0.33) WDR5PPARGPTGESALOX5SLC2A1
SCHEMBL5843423 0.84 CNR1 (0.39) PPARGPPARAFABP4FABP5CNR1
SCHEMBL5845465 0.84 PLA2G4B (0.43) WDR5PPARGPTGESALOX5PTPN11
SCHEMBL5844161 0.84 PLA2G4B (0.43) PTPN11KAT6AS1PR3
SCHEMBL5862002 0.83 NR1I2 (0.41) WDR5PPARGPTPN11KAT6APPARA
SCHEMBL5862927 0.82 PTPN11 (0.40) WDR5PTPN11GAAL3MBTL1S1PR3
SCHEMBL5862527 0.81 PTPN11 (0.42) CES2CES1WDR5PTPN11S1PR3
SCHEMBL5845161 0.81 CCNE2 (0.38) WDR5PPARGPTGESALOX5KAT6A
SCHEMBL5844576 0.81 KDM4E (0.37) WDR5PPARGPTGESALOX5SLC2A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 CES2 1564/4885CES1 2844/4885WDR5 3918/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.