SCHEMBL5844749

SCHEMBL5844749

CCCCCOc1cc(C)c(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2cc(OCCCCC)c(OCCCCC)cc2C)cc1OCCCCC

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.37
HTT P42858 2/20 0.37
S1PR3 Q99500 1/20 0.37
TSHR P16473 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
MAPK1 P28482 1/20 0.36
MCOLN3 Q8TDD5 1/20 0.35
THRA P10827 2/20 0.35
THRB P10828 2/20 0.35
MAPT P10636 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
PDIA6 Q15084 1/20 0.35
SMPD1 P17405 3/20 0.34
ESR1 P03372 3/20 0.34
S1PR5 Q9H228 2/20 0.34
WDR5 P61964 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5844944 0.99 S1PR3 (0.39) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5843958 0.99 S1PR3 (0.39) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5844975 0.99 S1PR3 (0.39) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5843996 0.99 S1PR3 (0.39) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5845625 0.99 S1PR3 (0.39) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5845626 0.96 LMNA (0.38) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL382647 0.92 HTT (0.43) LMNAHTTS1PR3TSHRSMN1; SMN2
SCHEMBL5844982 0.91 S1PR3 (0.39) LMNAS1PR3MAPTS1PR5WDR5
SCHEMBL5844432 0.91 MEN1 (0.38) LMNAS1PR3THRATHRBMAPT
SCHEMBL6737066 0.88 THRA (0.40) LMNAHTTS1PR3TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 LMNA 597/4885HTT 2186/4885S1PR3 1891/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.