SCHEMBL5848007

SCHEMBL5848007

NC1(N)C=C(c2ccccc2)C=CC1(C(=O)O)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
LMNA P02545 1/20 0.32
MEN1 O00255 1/20 0.32
GAA P10253 1/20 0.32
KMT2A Q03164 1/20 0.32
BCAT2 O15382 1/20 0.32
TP53 P04637 1/20 0.31
FFAR1 O14842 1/20 0.31
MGLL Q99685 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5847347 0.86 THRB (0.32) THRBTDP1LMNAMEN1GAA
SCHEMBL22465 0.85 THRB (0.34) THRBTDP1LMNAMEN1GAA
SCHEMBL20702294 0.82 THRB (0.36) THRBTDP1TP53MGLL
SCHEMBL28358615 0.81 THRB (0.32) THRBTDP1TP53
SCHEMBL9680128 0.81 ALDH1A1 (0.34) THRBTDP1MEN1GAAKMT2A
SCHEMBL17202669 0.79 THRB (0.36) THRBTDP1MEN1KMT2ATP53
SCHEMBL2465711 0.77 ALDH1A1 (0.35) TDP1
SCHEMBL15090810 0.76 ALDH1A1 (0.31)
SCHEMBL14322367 0.72 HDAC1 (0.33)
Ammonia Solution, Strong SCHEMBL8509907 0.70 HDAC1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN claimed
CN-115364696-A Porous graphene oxide membrane and preparation method and application thereof 暨南大学 2022-11-22 CN claimed
CN-121736592-A Preparation method of novel corrosion-resistant coating for metal material 衢州市晨龙五金有限责任公司 2026-03-27 CN disclosed
CN-120442128-A Preparation method of corrosion-resistant protective coating for metal 辽宁中舟得水环保科技有限公司 2025-08-08 CN disclosed
CN-115960352-B Photosensitive polyimide precursor resin, preparation method thereof and photosensitive resin composition 深圳市道尔顿电子材料股份有限公司 2024-07-05 CN disclosed
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN disclosed
CN-115364696-B Porous graphene oxide film and preparation method and application thereof 暨南大学 2024-01-23 CN disclosed
CN-115960352-A Photosensitive polyimide precursor resin, preparation method thereof and photosensitive resin composition 深圳市道尔顿电子材料有限公司 2023-04-14 CN disclosed
CN-115364696-A Porous graphene oxide membrane and preparation method and application thereof 暨南大学 2022-11-22 CN disclosed
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed