SCHEMBL5848878

SCHEMBL5848878

C=CC(=O)OCCNC(=O)c1ccccc1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.52
THRB P10828 1/20 0.50
KMT2A Q03164 3/20 0.49
APEX1 P27695 1/20 0.49
LMNA P02545 1/20 0.48
MAPT P10636 1/20 0.48
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
KDM4E B2RXH2 1/20 0.44
TAAR1 Q96RJ0 1/20 0.44
HTT P42858 3/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2C19 P33261 1/20 0.43
TSHR P16473 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
HCRTR1 O43613 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19291843 1.00 MAPK1 (0.52) MAPK1THRBKMT2AAPEX1LMNA
SCHEMBL28014190 0.91 HTT (0.47) MAPK1THRBKMT2AAPEX1LMNA
SCHEMBL29315485 0.85 CHRNB2 (0.52) MAPK1THRBKMT2ALMNAHTT
SCHEMBL28504974 0.84 SMN1; SMN2 (0.61) THRBLMNANPC1RAB9ANPSR1
Phthalic Acid SCHEMBL301414 0.80 TSHR (0.63) THRBKMT2AMAPTKDM4EHTT
Phthalic Acid SCHEMBL29430009 0.80 TSHR (0.63) THRBKMT2AMAPTKDM4EHTT
SCHEMBL28536283 0.80 HPGD (0.47) MAPK1THRBKMT2ANPC1RAB9A
Phthalic Acid SCHEMBL6831159 0.79 THRB (0.55) MAPK1THRBKMT2ALMNATSHR
SCHEMBL67527 0.79 THRB (0.59) MAPK1THRBKMT2ALMNANPC1
SCHEMBL30198617 0.79 THRB (0.59) MAPK1THRBKMT2ALMNANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20040265731-A1 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2004-12-30 US disclosed