⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12794904 | 0.79 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL12794902 | 0.75 | — | — | |
| SCHEMBL13058434 | 0.73 | — | — | |
| SCHEMBL5848949 | 0.72 | SMN1; SMN2 (0.36) | — | |
| SCHEMBL5848962 | 0.71 | — | — | |
| SCHEMBL14593908 | 0.68 | HTT (0.33) | — | |
| SCHEMBL13649526 | 0.67 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL5848929 | 0.67 | — | — | |
| SCHEMBL5849038 | 0.67 | HTT (0.33) | — | |
| SCHEMBL1217653 | 0.67 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |