SCHEMBL5849474

SCHEMBL5849474

COc1ccccc1[S+](c1ccccc1)c1ccccc1.O=S(=O)([O-])c1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAD52 P43351 1/20 0.35
KMT2A Q03164 5/20 0.34
MEN1 O00255 4/20 0.34
CYP3A4 P08684 3/20 0.34
CYP1A2 P05177 2/20 0.34
CYP2C9 P11712 2/20 0.34
CYP2C19 P33261 2/20 0.34
HPGD P15428 2/20 0.34
HSD17B10 Q99714 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
KDM4E B2RXH2 1/20 0.34
USP2 O75604 1/20 0.34
THRB P10828 1/20 0.34
MIF P14174 1/20 0.34
APEX1 P27695 1/20 0.34
MAPK1 P28482 1/20 0.34
RECQL P46063 1/20 0.34
HIF1A Q16665 1/20 0.34
PTPN1 P18031 2/20 0.33
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6856382 0.90 PTPN1 (0.34) RAD52KMT2AMEN1CYP3A4CYP1A2
SCHEMBL450356 0.84 NR4A1 (0.39) KMT2AMEN1CYP3A4CYP1A2HPGD
SCHEMBL3195405 0.84 TDP1 (0.39) KMT2AMEN1TDP1KDM4EMAPK1
SCHEMBL453181 0.80 NR1I2 (0.37) CYP3A4CYP1A2HPGDHSD17B10TDP1
SCHEMBL29754167 0.80 NR1I2 (0.37) CYP3A4CYP1A2HPGDHSD17B10TDP1
SCHEMBL3205020 0.80 ALDH1A1 (0.37) CYP3A4CYP1A2HPGDHSD17B10TDP1
SCHEMBL449949 0.80 TDP1 (0.38) CYP3A4HPGDHSD17B10TDP1KDM4E
SCHEMBL5849940 0.79 KDM4E (0.32) KDM4EMAPK1MAPTNR4A1
SCHEMBL5851079 0.77 HTR6 (0.46) KMT2AHPGDTDP1KDM4EAPEX1
SCHEMBL2900933 0.77 PPARG (0.32) CYP3A4CYP2C9CYP2C19HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6984473-B2 Light blocking; amplified photoresist; acid generators; high density semiconductors MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-01-10 US disclosed
US-20030152845-A1 Mask blank, protective film therefor and method of patterning mask blank MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-08-14 US disclosed