SCHEMBL5850894

SCHEMBL5850894

C=C(C)C(=O)OC1CC2CC1C1OC(=O)CC21

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.37
NPC1 O15118 1/20 0.37
POLB P06746 1/20 0.37
MAPT P10636 1/20 0.37
PKM P14618 1/20 0.37
HTT P42858 1/20 0.37
RECQL P46063 1/20 0.37
RAB9A P51151 1/20 0.37
ATM Q13315 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
GPX4 P36969 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3798732 0.89 KDM4E (0.37) KDM4ENPC1POLBMAPTPKM
SCHEMBL3805305 0.81 GPX4 (0.33) KDM4ENPC1POLBMAPTPKM
SCHEMBL11963896 0.81 KDM4E (0.36) KDM4ENPC1POLBMAPTPKM
SCHEMBL3806339 0.80 GPX4 (0.33) KDM4ENPC1POLBMAPTPKM
SCHEMBL12170326 0.78 KDM4E (0.37) KDM4ENPC1POLBMAPTPKM
SCHEMBL12121129 0.77 ALDH1A1 (0.33)
SCHEMBL652156 0.77 ALDH1A1 (0.33) KDM4ENPC1POLBMAPTPKM
SCHEMBL448688 0.76 KDM4E (0.33) KDM4ENPC1POLBMAPTPKM
SCHEMBL12511092 0.75 NPC1 (0.40) KDM4ENPC1POLBMAPTPKM
SCHEMBL12121076 0.75 KDM4E (0.32) KDM4ENPC1POLBMAPTPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1354897-B1 POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR DAICEL CHEM (JP) 2012-10-24 EP disclosed
US-7105268-B2 Polymer for photoresist and resin compositions therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-09-12 US disclosed
EP-1354897-A1 POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR Daicel Chemical Industries, Ltd. (JP) 2003-10-22 EP disclosed
US-20030148210-A1 Polymer for photoresist and resin compositions therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030148210-A1 Polymer for photoresist and resin compositions therefor LCP1, DOT1L, PRMT1 KDM4E 143/4885NPC1 4338/4885POLB 1232/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.