Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | GPX4 | P36969 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16858287 | 0.87 | ALDH1A1 (0.33) | — | |
| SCHEMBL13898924 | 0.86 | TAS2R46 (0.33) | — | |
| SCHEMBL14531660 | 0.84 | — | — | |
| SCHEMBL686464 | 0.82 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL9975579 | 0.81 | — | — | |
| SCHEMBL786728 | 0.80 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10231851 | 0.80 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL47307 | 0.80 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL22840948 | 0.80 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL15166539 | 0.80 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9366963-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20150147697-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-28 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | disclosed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-7563563-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-21 | — | — | US | disclosed |
| US-7563563-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-21 | — | — | US | disclosed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | disclosed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | disclosed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | disclosed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | disclosed |
| US-20070231736-A1 | Bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2007-10-04 | — | — | US | disclosed |
| US-20070231736-A1 | Bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2007-10-04 | — | — | US | disclosed |
| EP-1790645-A1 | LACTONE COMPOUND, LACTONE-CONTAINING MONOMER, POLYMER OF THOSE, RESIST COMPOSITION USING SAME, METHOD FOR FORMING PATTERN USING SAME | Central Glass Company, Limited (JP) | 2007-05-30 | — | — | EP | disclosed |