Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 15/20 | 0.36 |
| ▸ | CA2 | P00918 | 15/20 | 0.36 |
| ▸ | MMP1 | P03956 | 4/20 | 0.34 |
| ▸ | MMP2 | P08253 | 4/20 | 0.34 |
| ▸ | MMP9 | P14780 | 4/20 | 0.34 |
| ▸ | MMP8 | P22894 | 4/20 | 0.34 |
| ▸ | MMP13 | P45452 | 4/20 | 0.34 |
| ▸ | F2 | P00734 | 2/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.32 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.32 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.31 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.31 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6331113 | 0.99 | CA2 (0.37) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL5851781 | 0.84 | CA1 (0.32) | CA1CA2 | |
| SCHEMBL379586 | 0.82 | CA1 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1771806 | 0.81 | CA2 (0.40) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1419588 | 0.75 | CA1 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6479936 | 0.71 | CA2 (0.45) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL5851127 | 0.69 | TDP1 (0.37) | CA1CA2 | |
| SCHEMBL27366575 | 0.69 | PIK3CD (0.44) | CA1CA2MMP1MMP2MMP9 | |
| Iodide SCHEMBL5315919 | 0.69 | PIK3CD (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6900759 | 0.69 | CA2 (0.46) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6984473-B2 | Light blocking; amplified photoresist; acid generators; high density semiconductors | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2006-01-10 | — | — | US | disclosed |
| US-20030152845-A1 | Mask blank, protective film therefor and method of patterning mask blank | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-08-14 | — | — | US | disclosed |