Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 18/20 | 0.40 |
| ▸ | CA1 | P00915 | 17/20 | 0.40 |
| ▸ | MMP1 | P03956 | 6/20 | 0.38 |
| ▸ | MMP2 | P08253 | 6/20 | 0.38 |
| ▸ | MMP9 | P14780 | 6/20 | 0.38 |
| ▸ | MMP8 | P22894 | 6/20 | 0.38 |
| ▸ | MMP13 | P45452 | 6/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL379586 | 0.98 | CA1 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6331113 | 0.82 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5950044 | 0.82 | CA2 (0.34) | CA2CA1HSD11B1 | |
| SCHEMBL5851106 | 0.81 | CA1 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1419588 | 0.76 | CA1 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6900759 | 0.74 | CA2 (0.46) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2058746 | 0.73 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL28289623 | 0.72 | CA2 (0.45) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6479936 | 0.72 | CA2 (0.45) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6336252 | 0.71 | KMT2A (0.44) | HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8323868-B2 | Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-04 | — | — | US | disclosed |
| US-20110111339-A1 | BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-12 | — | — | US | disclosed |
| US-7550254-B2 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-23 | — | — | US | disclosed |
| EP-1405140-A4 | RESIST COMPOSITIONS WITH POLYMERS HAVING 2-CYANO ACRYLIC MONOMER | IBM (US) | 2007-12-12 | — | — | EP | disclosed |
| US-20070202440-A1 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-30 | — | — | US | disclosed |
| US-7261992-B2 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-28 | — | — | US | disclosed |
| US-6902874-B2 | Resist compositions with polymers having 2-cyano acrylic monomer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-06-07 | — | — | US | disclosed |
| US-6756180-B2 | HAVING ACID LABILE PROTECTING, LACTONE AND FLUOROALCOHOL MOIETIES; ETCH RESISTANCE; REDUCED POSTEXPOSURE BAKE SENSITIVITY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-29 | — | — | US | disclosed |
| EP-1405140-A1 | RESIST COMPOSITIONS WITH POLYMERS HAVING 2-CYANO ACRYLIC MONOMER | International Business Machines Corporation (US) | 2004-04-07 | — | — | EP | disclosed |
| US-6635401-B2 | Comprising imaging polymer and radiation sensitive acid generator, imaging polymer comprising cyano-modified acrylic monomer units comprising an acrylic moiety with a cyano group pendant therefrom | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-10-21 | — | — | US | disclosed |
| US-6562554-B1 | Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-05-13 | — | — | US | disclosed |
| US-6534239-B2 | Resolution lithographic performance; reduced shrinkage upon exposure and/or post-exposure bake; imaging | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-03-18 | — | — | US | disclosed |
| WO-2003001294-A1 | RESIST COMPOSITIONS WITH POLYMERS HAVING 2-CYANO ACRYLIC MONOMER | INTERNATIONAL BUSINESS MACHINES (US) | 2003-01-03 | — | — | WO | disclosed |
| WO-2002088077-A2 | RESIST COMPOSITIONS WITH POLYMERS HAVING PENDANT GROUPS CONTAINING PLURAL ACID LABILE MOIETIES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-11-07 | — | — | WO | disclosed |
| US-20020090572-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES U.S. INC. | 2002-07-11 | — | — | US | disclosed |
| US-20020081520-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES INC. (KY) | 2002-06-27 | — | — | US | disclosed |
| US-6265134-B1 | IMPROVED CONTRAST (SOLUBILITY DIFFERENTIAL), SHRINKAGE AND PROCESSING KINETICS ON RADIATION EXPOSURE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-24 | — | — | US | disclosed |
| US-6140015-A | CROSSLINKED POLYMER WITH POLAR PENDANT GROUP, PHOTOSENSITIVE ACID GENERATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-10-31 | — | — | US | disclosed |