Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.31 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5851106 | 0.84 | CA1 (0.36) | CA1CA2 | |
| SCHEMBL6331113 | 0.83 | CA2 (0.37) | CA1CA2 | |
| SCHEMBL5950044 | 0.78 | CA2 (0.34) | CA1CA2CA5ACA9KEAP1 | |
| SCHEMBL5851127 | 0.76 | TDP1 (0.37) | CA1CA2CA5ACA9KEAP1 | |
| SCHEMBL7889055 | 0.73 | CA4 (0.41) | CA1CA2CA9L3MBTL1 | |
| SCHEMBL3518888 | 0.70 | KCNN4 (0.38) | GAAL3MBTL1 | |
| SCHEMBL1419536 | 0.70 | CXCR2 (0.31) | — | |
| Toluene SCHEMBL28809616 | 0.66 | ACHE (0.46) | CA1CA2CA5ACA9NR1H2 | |
| Trifluoromethanesulfonic Acid SCHEMBL8735170 | 0.64 | GPR3 (0.47) | CA1CA2CA5ACA9 | |
| SCHEMBL379586 | 0.64 | CA1 (0.38) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6984473-B2 | Light blocking; amplified photoresist; acid generators; high density semiconductors | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2006-01-10 | — | — | US | disclosed |
| US-20030152845-A1 | Mask blank, protective film therefor and method of patterning mask blank | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-08-14 | — | — | US | disclosed |
| US-5882843-A | ACRYLIC POLYMER, INITIATOR, SOLVENTS, THERMAL CROSSLINKER AND PIGMENTS | HOECHST JAPAN LIMITED (JP) | 1999-03-16 | — | — | US | disclosed |
| EP-0713144-B1 | Photosensitive resin composition | HOECHST JAPAN (JP) | 1998-09-23 | — | — | EP | disclosed |
| EP-0713144-A2 | Photosensitive resin composition | HOECHST JAPAN LIMITED (JP) | 1996-05-22 | — | — | EP | disclosed |