Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10961708 | 0.83 | HSD17B10 (0.33) | SLC7A5 | |
| SCHEMBL10475855 | 0.82 | ALDH1A1 (0.38) | ALDH1A1TSHR | |
| SCHEMBL15284985 | 0.78 | TSHR (0.42) | ALDH1A1TSHR | |
| SCHEMBL15284981 | 0.78 | TSHR (0.42) | ALDH1A1TSHR | |
| SCHEMBL372920 | 0.76 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL28194319 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL3081441 | 0.74 | TSHR (0.43) | ALDH1A1TSHRTHRB | |
| SCHEMBL1898448 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL11437995 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL8415532 | 0.73 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7087356-B2 | 193nm resist with improved post-exposure properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-08-08 | — | — | US | disclosed |
| EP-1550003-A1 | 193NM RESIST | International Business Machines Corporation (US) | 2005-07-06 | — | — | EP | disclosed |
| US-6828083-B2 | Comprising photoactive component and polymer that comprises groups reactive to crosslinking and photoacid-labile groups | SHIPLEY COMPANY, L.L.C. | 2004-12-07 | — | — | US | disclosed |
| WO-2004029719-A1 | 193NM RESIST | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2004-04-08 | — | — | WO | disclosed |
| US-20040063024-A1 | 193NM resist with improved post-exposure properties | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-04-01 | — | — | US | disclosed |
| US-20020012869-A1 | Positive photoresists containing crosslinked polymers | SHIPLEY COMPANY, L.L.C. | 2002-01-31 | — | — | US | disclosed |
| US-20010053496-A1 | Photoresist compositions and use of same | SHIPLEY COMPANY, L.L.C. | 2001-12-20 | — | — | US | disclosed |
| EP-1143300-A1 | Photoresist compositions and use of same | Shipley Company LLC (US) | 2001-10-10 | — | — | EP | disclosed |
| EP-1126321-A1 | Positive photoresists containing crosslinked polymers | Shipley Company LLC (US) | 2001-08-22 | — | — | EP | disclosed |