SCHEMBL58563

SCHEMBL58563

CSc1ccc(C(=O)C(C)(C)N(C)C)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
TSHR P16473 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
MAPK1 P28482 1/20 0.50
PLK1 P53350 1/20 0.47
EPHX2 P34913 1/20 0.42
NR1H4 Q96RI1 1/20 0.42
NOX1 Q9Y5S8 1/20 0.40
HAO1 Q9UJM8 1/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
LMNA P02545 2/20 0.38
MAPT P10636 2/20 0.38
RAB9A P51151 2/20 0.38
NFKB1 P19838 2/20 0.38
GAA P10253 1/20 0.38
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14156792 0.87 HPGD (0.50) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL727319 0.83 ALDH1A1 (0.49) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL725688 0.83 ALDH1A1 (0.46) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL726032 0.81 ALDH1A1 (0.47) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL10385994 0.81 LMNA (0.44) ALDH1A1SMN1; SMN2MAPK1MEN1KMT2A
SCHEMBL10384767 0.81 HPGD (0.56) ALDH1A1MAPK1LMNAMAPTRAB9A
SCHEMBL725753 0.80 TSHR (0.47) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL13610814 0.80 ALDH1A1 (0.56) ALDH1A1TSHRSMN1; SMN2MAPK1PLK1
SCHEMBL10947494 0.80 CES2 (0.44) ALDH1A1MAPTRAB9AHPGD
SCHEMBL10945414 0.80 HPGD (0.50) ALDH1A1MAPK1LMNAMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080180503-A1 INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2008-07-31 US claimed
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
US-12210285-B2 Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device TORAY INDUSTRIES, INC. (JP) 2025-01-28 US disclosed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117882497-A Adhesive film for circuit connection, circuit connection structure, and method for producing same 株式会社力森诺科 2024-04-12 CN disclosed
CN-117651722-A Thiol-containing composition, photocurable composition, and thermosetting composition 株式会社力森诺科 2024-03-05 CN disclosed
US-11650499-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-05-16 US disclosed
US-11599023-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-03-07 US disclosed
WO-2023003011-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION 昭和電工株式会社 2023-01-26 WO disclosed
WO-2023276889-A1 ADHESIVE FILM FOR CONNECTING CIRCUIT, CIRCUIT CONNECTION STRUCTURE, AND METHOD FOR MANUFACTURING SAME 昭和電工マテリアルズ株式会社 2023-01-05 WO disclosed
US-20070160921-A1 Electrophotographic photoconductor, method of producing the same and image forming apparatus SHARP KABUSHIKI KAISHA (JP) 2007-07-12 US disclosed
US-20070160921-A1 Electrophotographic photoconductor, method of producing the same and image forming apparatus SHARP KABUSHIKI KAISHA (JP) 2007-07-12 US disclosed
EP-1805137-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-07-11 EP disclosed
WO-2006046733-A1 THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND SHOWA DENKO K.K (JP) 2006-05-04 WO disclosed
WO-2006046736-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO K.K. (JP) 2006-05-04 WO disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed
US-5145885-A Morpholine compound, binders CIBA-GEIGY CORPORATION (US) 1992-09-08 US disclosed
US-4992547-A Aminoaryl ketone photoinitiators CIBA-GEIGY CORPORATION (US) 1991-02-12 US disclosed
US-4960746-A A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE CIBA-GEIGY CORPORATION (US) 1990-10-02 US disclosed