SCHEMBL5857445

SCHEMBL5857445

C=C(CC)C(=O)O.C=C(CC=CC(=O)O)C(=O)OCCO

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 4/20 0.33
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916717 0.89 TSHR (0.38) HCAR2TSHR
SCHEMBL10482279 0.87 TSHR (0.52) HCAR2TSHR
Acrylic Acid SCHEMBL7214438 0.85 TSHR (0.43) TSHR
SCHEMBL8516879 0.83 THRB (0.43) HCAR2TSHR
Acrylic Acid Ethyl Ester SCHEMBL10579424 0.82 TSHR (0.46) HCAR2TSHR
SCHEMBL7059943 0.82 ALOX15 (0.34) HCAR2TSHR
SCHEMBL17997322 0.82 ALDH1A1 (0.42) TSHR
SCHEMBL10347220 0.82 HCAR2 (0.50) HCAR2TSHR
SCHEMBL4587327 0.80 HCAR2 (0.35) HCAR2TSHR
1,1-Dichloroethene SCHEMBL5272297 0.80 THRB (0.40) HCAR2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7081325-B2 Photoresist polymer and photoresist composition including the same HYNIX SEMICONDUCTOR INC. (KR) 2006-07-25 US disclosed
US-20040265743-A1 Photoresist polymer and photoresist composition including the same HYNIX SEMICONDUCTOR INC. (KR) 2004-12-30 US disclosed