SCHEMBL5861632

SCHEMBL5861632

CCCCCCOc1ccc(C(C)(C)C)cc1S

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.47
KDM4E B2RXH2 4/20 0.45
RECQL P46063 1/20 0.45
MAPT P10636 1/20 0.42
MAPK1 P28482 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
THRA P10827 1/20 0.41
THRB P10828 1/20 0.41
GAA P10253 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CHUK O15111 1/20 0.40
DAPK3 O43293 1/20 0.40
JAK2 O60674 1/20 0.40
ROCK2 O75116 1/20 0.40
PRKCG P05129 1/20 0.40
CDK1 P06493 1/20 0.40
PIM1 P11309 1/20 0.40
RPS6KB1 P23443 1/20 0.40
CDK2 P24941 1/20 0.40
AKT1 P31749 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9189177 1.00 ESR1 (0.47) ESR1KDM4ERECQLMAPTMAPK1
SCHEMBL5959576 0.94 KDM4E (0.46) ESR1KDM4ERECQLMAPTMAPK1
SCHEMBL9726372 0.87 CNR2 (0.49) ESR1
SCHEMBL7767148 0.85 ESR1 (0.43) ESR1MAPTMAPK1NPSR1THRA
SCHEMBL19194972 0.84 ESR1 (0.63) ESR1KDM4ERECQLMAPTMAPK1
SCHEMBL7456145 0.83 THRA (0.54) ESR1KDM4ERECQLMAPTMAPK1
SCHEMBL8764746 0.82 CNR2 (0.47) ESR1
SCHEMBL3195873 0.82 ALDH1A1 (0.46) ESR1KDM4ERECQLMAPTMAPK1
SCHEMBL9697378 0.81 ESR1 (0.57) ESR1KDM4ERECQLTHRATHRB
SCHEMBL2851943 0.81 THRA (0.49) ESR1KDM4ERECQLMAPTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 ESR1 448/4885KDM4E 1704/4885RECQL 4028/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.