SCHEMBL5376952

SCHEMBL5376952

CC(C)c1cc(C(C)C)c(S(=O)(=O)O)c(C(C)C)c1[N+](=O)[O-].[Ag]

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 1/20 0.47
FABP4 P15090 1/20 0.47
FABP5 Q01469 1/20 0.47
PDK1 Q15118 1/20 0.32
MEN1 O00255 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAPT P10636 1/20 0.32
TSHR P16473 1/20 0.32
NPY1R P25929 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HPGD P15428 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
MCOLN3 Q8TDD5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5388305 0.98 FABP3 (0.49) FABP3FABP4FABP5PDK1MEN1
SCHEMBL178363 0.98 FABP3 (0.49) FABP3FABP4FABP5PDK1MEN1
Silver SCHEMBL5376950 0.83 FABP3 (0.34) FABP3FABP4FABP5PDK1MEN1
SCHEMBL27726992 0.83 FABP3 (0.36) FABP3FABP4FABP5MEN1TP53
SCHEMBL14085363 0.81 FABP3 (0.46) FABP3FABP4FABP5PDK1MEN1
SCHEMBL27583174 0.80 FABP3 (0.38) FABP3FABP4FABP5PDK1MEN1
SCHEMBL9004701 0.80 PDK1 (0.37) PDK1MEN1TP53CYP3A4MAPT
SCHEMBL5862368 0.79 FABP3 (0.36) FABP3FABP4FABP5
SCHEMBL12569528 0.74 FABP3 (0.33) FABP3FABP4FABP5
SCHEMBL12406502 0.74 FABP4 (0.56) FABP3FABP4FABP5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1963667-B Chemically amplified positive resist composition SUMITOMO CHEMICAL CO 2010-09-29 CN disclosed
CN-100565340-C Chemically Amplified Photoresist Composition SUMITOMO CHEMICAL CO (JP) 2009-12-02 CN disclosed
US-7220532-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-22 US disclosed
CN-1963667-A Chemically amplified positive resist composition SUMITOMO CHEMICAL CO (JP) 2007-05-16 CN disclosed
US-7135268-B2 Using aromatic sulfonate compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-14 US disclosed
US-20050031984-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2005-02-10 US disclosed
CN-1499296-A Chemical amplifying positive resist compsn. ס�ѻ�ѧ��ҵ��ʽ���� 2004-05-26 CN disclosed
CN-1488996-A Chemically Amplified Photoresist Composition ס�ѻ�ѧ��ҵ��ʽ���� 2004-04-14 CN disclosed
US-20040053171-A1 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2004-03-18 US disclosed
US-20040029037-A1 Amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-02-12 US disclosed