Linolenic Acid

Linolenic Acid

SCHEMBL5874283

CC/C=C\C/C=C\C/C=C\CCCCCCCC(=O)O.c1ccc2ncccc2c1

nearest known ligand 0.62

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.62
F7 P08709 7/20 0.62
F3 P13726 7/20 0.62
PPARG P37231 6/20 0.62
PPARD Q03181 5/20 0.62
PPARA Q07869 5/20 0.62
CYP19A1 P11511 4/20 0.62
PTGS1 P23219 4/20 0.62
FFAR1 O14842 4/20 0.62
OXER1 Q8TDS5 3/20 0.62
MAPT P10636 2/20 0.62
KMT2A Q03164 2/20 0.62
KDM4E B2RXH2 2/20 0.62
LMNA P02545 2/20 0.62
CYP3A4 P08684 2/20 0.62
HPGD P15428 2/20 0.62
ALOX15 P16050 2/20 0.62
FFAR4 Q5NUL3 2/20 0.62
HSD17B10 Q99714 2/20 0.62
TDP1 Q9NUW8 2/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Linoleic Acid SCHEMBL5874446 0.93 PPARG (0.62) ALDH1A1F7F3PPARGPPARD
Oleic Acid SCHEMBL28225680 0.90 FAAH (0.58) ALDH1A1F7F3PPARGPPARD
Oleic Acid SCHEMBL5875277 0.90 FAAH (0.58) ALDH1A1F7F3PPARGPPARD
Oleic Acid SCHEMBL5875261 0.90 FAAH (0.58) ALDH1A1F7F3PPARGPPARD
Arachidonic Acid SCHEMBL5874643 0.89 PPARG (0.61) ALDH1A1F7F3PPARGPPARD
Arachidonic Acid SCHEMBL5874638 0.89 PPARG (0.61) ALDH1A1F7F3PPARGPPARD
Linoleic Acid SCHEMBL28181625 0.83 ALDH1A1 (0.50) ALDH1A1F7F3PPARGPPARD
Sebacic Acid SCHEMBL5875085 0.83 ALDH1A1 (0.59) ALDH1A1MAPT
Sebacic Acid SCHEMBL5875076 0.83 ALDH1A1 (0.59) ALDH1A1MAPT
Nonanoate SCHEMBL5874434 0.82 GPR84 (0.50) ALDH1A1PPARGPPARDPPARAFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed