Sebacic Acid

Sebacic Acid

SCHEMBL5874346

CCC[N+](CCC)(CCC)CCC.O=C([O-])CCCCCCCCC(=O)O

nearest known ligand 0.61

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.59
PPARG P37231 7/20 0.59
PPARD Q03181 7/20 0.59
PPARA Q07869 7/20 0.59
HDAC11 Q96DB2 5/20 0.59
TSHR P16473 4/20 0.59
FABP3 P05413 4/20 0.59
PTPN1 P18031 3/20 0.59
ALDH1A1 P00352 2/20 0.59
TLR2 O60603 2/20 0.59
TDP1 Q9NUW8 2/20 0.59
FABP4 P15090 2/20 0.59
KMT2A Q03164 2/20 0.59
SLC22A6 Q4U2R8 1/20 0.59
SLC22A8 Q8TCC7 1/20 0.59
MEN1 O00255 1/20 0.59
ESR1 P03372 1/20 0.59
ALOX15 P16050 1/20 0.59
PDE4A P27815 1/20 0.59
PDE3A Q14432 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrapropylammonium SCHEMBL105339 0.98 AKR1B1 (0.58) GPR84PPARGPPARDPPARAHDAC11
Tetrapropylammonium SCHEMBL107055 0.94 AKR1B1 (0.52) GPR84PPARGPPARDPPARAHDAC11
Sebacic Acid SCHEMBL5874337 0.92 FABP3 (0.59) FABP3
Tetrabuthylammonium SCHEMBL2230707 0.91 GPR84 (0.63) GPR84PPARGPPARDPPARAHDAC11
Stearic Acid SCHEMBL109614 0.90 FABP3 (0.62) FABP3
Tetrapropylammonium SCHEMBL106267 0.90 FABP3 (0.62) FABP3
Tetrapropylammonium SCHEMBL104595 0.90 FABP3 (0.62) FABP3
Tetrapropylammonium SCHEMBL106722 0.90 FABP3 (0.62) FABP3
Tetrapropylammonium SCHEMBL106754 0.90 FABP3 (0.62) FABP3
Dodecanoate SCHEMBL19878777 0.90 FABP3 (0.62) FABP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed