Phenol

Phenol

SCHEMBL5874437

CC(O)NC(C)O.Oc1ccccc1

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 2/20 0.55
CA12 O43570 1/20 0.55
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
CA3 P07451 1/20 0.55
CA4 P22748 1/20 0.55
CA9 Q16790 1/20 0.55
TDP1 Q9NUW8 1/20 0.55
CA14 Q9ULX7 1/20 0.55
ADRA1A P35348 4/20 0.41
HIF1A Q16665 4/20 0.41
CYP2D6 P10635 3/20 0.41
CYP2C19 P33261 3/20 0.41
ADRA2A P08913 3/20 0.41
ADRA2C P18825 3/20 0.41
CYP3A4 P08684 3/20 0.41
HTR1A P08908 2/20 0.41
SLC6A2 P23975 2/20 0.41
HTR2A P28223 2/20 0.41
OPRM1 P35372 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL10723523 0.85 TDP1 (0.55) GLACA12CA1CA2CA3
Phenol SCHEMBL8375278 0.84 CA12 (0.69) GLACA12CA1CA2CA3
Phenol SCHEMBL4294325 0.84 CA12 (0.69) GLACA12CA1CA2CA3
Phenol SCHEMBL7546796 0.82 TDP1 (0.58) GLACA12CA1CA2CA3
Phenol SCHEMBL7929451 0.81 CA12 (0.65) GLACA12CA1CA2CA3
Toluene SCHEMBL9767560 0.80 LMNA (0.55) GLATDP1ADRA1AHIF1ACYP2D6
Phenol SCHEMBL5874739 0.80 GLA (0.55) GLACA12CA1CA2CA3
Phenol SCHEMBL2898082 0.79 CA12 (0.61) GLACA12CA1CA2CA3
Phenol SCHEMBL7115665 0.79 CA12 (0.61) GLACA12CA1CA2CA3
Phenol SCHEMBL5875310 0.79 CA12 (0.61) GLACA12CA1CA2CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed