SCHEMBL5874583

SCHEMBL5874583

CCCCCCCCC(=O)O[n+]1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAM P19021 2/20 0.49
DGKA P23743 1/20 0.48
LMNA P02545 2/20 0.46
GPR84 Q9NQS5 7/20 0.45
PPARG P37231 7/20 0.45
PPARD Q03181 7/20 0.45
PPARA Q07869 7/20 0.45
HDAC11 Q96DB2 5/20 0.45
TSHR P16473 4/20 0.45
PTPN1 P18031 3/20 0.45
ALDH1A1 P00352 2/20 0.45
TLR2 O60603 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
FABP4 P15090 2/20 0.45
SLC22A6 Q4U2R8 1/20 0.45
SLC22A8 Q8TCC7 1/20 0.45
MEN1 O00255 1/20 0.45
ESR1 P03372 1/20 0.45
ALOX15 P16050 1/20 0.45
PDE4A P27815 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5874365 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL10556965 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL5874710 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL11063539 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL5875398 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL5875224 1.00 PAM (0.49) PAMDGKALMNAGPR84PPARG
SCHEMBL5875055 0.98 PAM (0.46) PAMDGKALMNAGPR84PPARG
SCHEMBL5875241 0.91 PPARG (0.54) LMNAPPARGPPARDPPARATSHR
SCHEMBL5875417 0.91 LMNA (0.35) PAMDGKALMNAHDAC11TSHR
SCHEMBL5875252 0.89 TSHR (0.32) PAMDGKALMNATSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109097599-B Method for separating manganese, calcium and magnesium by synergistic extraction 中南大学 2021-06-04 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed