SCHEMBL5874597

SCHEMBL5874597

Nc1ccc(C(=O)ON2CCCCC2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.44
CYP1A2 P05177 2/20 0.44
CYP3A4 P08684 2/20 0.44
MAOA P21397 1/20 0.44
ALDH1A1 P00352 3/20 0.43
HSD17B10 Q99714 2/20 0.43
ESR1 P03372 1/20 0.43
HPGD P15428 1/20 0.41
NPC1 O15118 4/20 0.41
RAB9A P51151 4/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
KDM4E B2RXH2 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
SLC6A3 Q01959 1/20 0.41
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 2/20 0.40
HTT P42858 2/20 0.40
CYP2C9 P11712 1/20 0.40
TSHR P16473 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11128974 0.91 LMNA (0.48) LMNACYP1A2CYP3A4MAOAALDH1A1
SCHEMBL28988328 0.91 ALDH1A1 (0.48) ALDH1A1HPGDNPC1RAB9ASMN1; SMN2
SCHEMBL8992905 0.84 KMT2A (0.55) CYP1A2ALDH1A1ESR1HPGDRAB9A
SCHEMBL5874652 0.83 LMNA (0.42) LMNACYP1A2CYP3A4MAOAALDH1A1
SCHEMBL1249246 0.81 HPGD (0.53) LMNAALDH1A1HSD17B10HPGDNPC1
SCHEMBL28495717 0.81 HPGD (0.53) LMNAALDH1A1HSD17B10HPGDNPC1
SCHEMBL29098438 0.80 HPGD (0.52) LMNAALDH1A1HSD17B10HPGDNPC1
SCHEMBL2510973 0.79 KMT2A (0.50) LMNAALDH1A1HSD17B10HPGDNPC1
SCHEMBL28868005 0.79 HPGD (0.58) LMNACYP1A2ALDH1A1HPGDSMN1; SMN2
SCHEMBL15512510 0.78 SMN1; SMN2 (0.42) LMNACYP1A2CYP3A4MAOAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed