Trifluoroacetic Acid

Trifluoroacetic Acid

SCHEMBL5874612

O=C(O)C(F)(F)F.OCCON(OCCO)OCCO

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL2588842 0.83 TSHR (0.35)
Trifluoroacetic Acid SCHEMBL3202278 0.83
Trichloroacetic Acid SCHEMBL5875458 0.82 ALDH1A1 (0.46)
Oxalic Acid SCHEMBL5875016 0.80 TSHR (0.33)
SCHEMBL3709992 0.80 TSHR (0.48)
Acetic Acid SCHEMBL5874701 0.78 FFAR3 (0.37)
SCHEMBL30539 0.77 TSHR (0.44)
Tetraethylene Glycol SCHEMBL28726854 0.76 MEN1 (0.55)
Triethylene Glycol SCHEMBL28726912 0.76 MEN1 (0.55)
Succinic Acid SCHEMBL5874476 0.76 EGLN1 (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210403646-A1 ACID-CURABLE COMPOSITION 3M INNOVATIVE PROPERTIES COMPANY 2021-12-30 US disclosed
CN-113166407-A Acid curable composition 3M创新有限公司 2021-07-23 CN disclosed
EP-3650486-A1 ACID-CURABLE COMPOSITION 3M Innovative Properties Company (US) 2020-05-13 EP disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed