⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL28184042 | 0.84 | ALDH1A1 (0.32) | — | |
| Trifluoroacetic Acid SCHEMBL5874612 | 0.83 | — | — | |
| Acetic Acid SCHEMBL11055559 | 0.82 | FFAR3 (0.35) | — | |
| Carbamic Acid SCHEMBL9587580 | 0.80 | ACHE (0.33) | — | |
| SCHEMBL10793115 | 0.80 | CYP2D6 (0.35) | — | |
| Chloromethane SCHEMBL28006061 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL17607 | 0.79 | TSHR (0.39) | — | |
| Dimebutic Acid SCHEMBL28637705 | 0.79 | RIPK1 (0.33) | — | |
| Citric Acid SCHEMBL27804540 | 0.77 | ALDH1A1 (0.54) | — | |
| Propionic Acid SCHEMBL28719051 | 0.77 | FFAR3 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | claimed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | claimed |
| US-20130072411-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-03-21 | — | — | US | claimed |
| US-8293694-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-10-23 | — | — | US | claimed |
| EP-1381656-B1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2010-11-10 | — | — | EP | claimed |
| US-20100035785-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2010-02-11 | — | — | US | claimed |
| US-7605113-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2009-10-20 | — | — | US | claimed |
| EP-1446460-A4 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2009-08-19 | — | — | EP | claimed |
| CN-100456429-C | Aqueous cleaning composition for cleaning inorganic residues on semiconductor substrates containing copper specific corrosion inhibitors | ADVANCED TECH MATERIALS (US) | 2009-01-28 | — | — | CN | claimed |
| US-6896826-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-05-24 | — | — | US | claimed |
| EP-1446460-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-08-18 | — | — | EP | claimed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | claimed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | claimed |
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | disclosed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | disclosed |
| US-8999357-B2 | Methods and compositions for biocidal treatments | SISHIELD TECHNOLOGIES, INC. (US) | 2015-04-07 | — | — | US | disclosed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | disclosed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | disclosed |
| WO-2002077120-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-10-03 | — | — | WO | disclosed |
| US-20010050350-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. | 2001-12-13 | — | — | US | disclosed |