Malonic Acid

Malonic Acid

SCHEMBL5874737

CC(N)O.O=C(O)CC(=O)O

nearest known ligand 0.56

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.56
SRR Q9GZT4 1/20 0.56
GABRP O00591 2/20 0.48
GABRD O14764 2/20 0.48
GABRA1 P14867 2/20 0.48
GABRB1 P18505 2/20 0.48
GABRG2 P18507 2/20 0.48
GABRB3 P28472 2/20 0.48
GABRA5 P31644 2/20 0.48
GABRA3 P34903 2/20 0.48
GABRA2 P47869 2/20 0.48
GABRB2 P47870 2/20 0.48
GABRA4 P48169 2/20 0.48
GABRE P78334 2/20 0.48
GABRA6 Q16445 2/20 0.48
GABRG1 Q8N1C3 2/20 0.48
GABRG3 Q99928 2/20 0.48
GABRQ Q9UN88 2/20 0.48
TP53 P04637 1/20 0.42
SLC7A5 Q01650 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL30288562 0.87 LDHA (0.64) LDHASRRGABRPGABRDGABRA1
Malonic Acid SCHEMBL5672090 0.86 LDHA (0.47) LDHASRRGABRPGABRDGABRA1
Threonine SCHEMBL5061769 0.82 SLC7A5 (0.50) LDHASRRGABRPGABRDGABRA1
Threonine SCHEMBL5061770 0.82 SLC7A5 (0.50) LDHASRRGABRPGABRDGABRA1
Malonic Acid SCHEMBL5996614 0.81 TP53 (0.69) LDHASRRTP53SLC22A6LMNA
Propionic Acid SCHEMBL1836514 0.81
Glycine SCHEMBL7122600 0.81
Succinic Acid SCHEMBL1833787 0.81 GABRP (0.62) GABRPGABRDGABRA1GABRB1GABRG2
Glycolic Acid SCHEMBL1832707 0.81
Malonic Acid SCHEMBL10430517 0.81 LDHA (0.56) LDHASRRGABRPGABRDGABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed