SCHEMBL5874810

SCHEMBL5874810

O=C(ON1CCCCC1)c1ccccc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.55
RAB9A P51151 3/20 0.55
HPGD P15428 7/20 0.50
ALDH1A1 P00352 6/20 0.50
HSD17B10 Q99714 5/20 0.50
MAPT P10636 5/20 0.50
KMT2A Q03164 5/20 0.50
MEN1 O00255 3/20 0.50
ALOX15 P16050 2/20 0.50
POLB P06746 2/20 0.50
GAA P10253 2/20 0.50
LMNA P02545 2/20 0.50
TSHR P16473 2/20 0.50
TDP1 Q9NUW8 2/20 0.46
KDM4E B2RXH2 6/20 0.44
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
HMGB1 P09429 1/20 0.42
CA4 P22748 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5875070 0.89 NPC1 (0.44) NPC1RAB9AHPGDALDH1A1HSD17B10
SCHEMBL28702972 0.83 TSHR (0.47) NPC1RAB9AHPGDALDH1A1HSD17B10
SCHEMBL5875374 0.83 TSHR (0.47) NPC1RAB9AHPGDALDH1A1HSD17B10
Morpholine Salicylate SCHEMBL24540 0.83 RAB9A (0.59) NPC1RAB9AHPGDALDH1A1HSD17B10
SCHEMBL27981018 0.81 HTT (0.50) NPC1RAB9AALDH1A1MAPTGAA
SCHEMBL8992984 0.80 CA12 (0.53) NPC1RAB9AALDH1A1GAATSHR
SCHEMBL1665838 0.79 TSHR (0.43) NPC1RAB9AHPGDALDH1A1HSD17B10
SCHEMBL10714629 0.79 POLB (0.56) HPGDALDH1A1KMT2APOLBGAA
SCHEMBL27980985 0.79 KMT2A (0.42) NPC1RAB9AHPGDALDH1A1KMT2A
SCHEMBL4451473 0.77 POLB (0.54) HPGDALDH1A1KMT2APOLBGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
WO-1999029705-A2 SIALYL LEWIS X AND SIALYL LEWIS A GLYCOMIMETICS GLYCOMED INCORPORATED (US) 1999-06-17 WO disclosed