Adipic Acid

Adipic Acid

SCHEMBL5874879

CN(C)C.O=C(O)CCCCC(=O)O

nearest known ligand 0.73

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Known targets — ChEMBL curated mechanism

SLC18A2SLC6A2SLC6A3

The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.73
TSHR P16473 5/20 0.69
NFKB1 P19838 1/20 0.69
PMP22 Q01453 1/20 0.69
AKR1B1 P15121 1/20 0.63
SLC22A6 Q4U2R8 2/20 0.62
GPR84 Q9NQS5 8/20 0.60
PPARG P37231 7/20 0.60
PPARD Q03181 7/20 0.60
PPARA Q07869 7/20 0.60
HDAC11 Q96DB2 5/20 0.60
PTPN1 P18031 3/20 0.60
ALDH1A1 P00352 2/20 0.60
TLR2 O60603 2/20 0.60
TDP1 Q9NUW8 2/20 0.60
FABP4 P15090 2/20 0.60
SLC22A8 Q8TCC7 1/20 0.60
MEN1 O00255 1/20 0.60
ESR1 P03372 1/20 0.60
ALOX15 P16050 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Adipic Acid SCHEMBL5874870 1.00 LMNA (0.73) LMNATSHRNFKB1PMP22AKR1B1
Pimelic Acid SCHEMBL27899346 0.97 TSHR (0.75) LMNATSHRNFKB1PMP22AKR1B1
Sebacic Acid SCHEMBL5874987 0.97 TSHR (0.75) LMNATSHRNFKB1PMP22AKR1B1
Trimethylammonium SCHEMBL11145139 0.97 TSHR (0.75) LMNATSHRNFKB1PMP22AKR1B1
Sebacic Acid SCHEMBL5874992 0.97 TSHR (0.75) LMNATSHRNFKB1PMP22AKR1B1
Azelaic Acid SCHEMBL17765551 0.97 TSHR (0.75) LMNATSHRNFKB1PMP22AKR1B1
Glutarate SCHEMBL5874412 0.93 SLC22A6 (0.73) LMNATSHRNFKB1PMP22AKR1B1
Glutarate SCHEMBL5874406 0.93 SLC22A6 (0.73) LMNATSHRNFKB1PMP22AKR1B1
Hexanoate SCHEMBL3414358 0.89 AKR1B1 (0.84) LMNATSHRAKR1B1SLC22A6GPR84
Adipic Acid SCHEMBL28248680 0.89 LMNA (0.58) LMNATSHRNFKB1PMP22AKR1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9953767-B2 Conductive polymer dispersion liquid, a conductive polymer, and use thereof TAYCA CORPORATION (JP) 2018-04-24 US disclosed
CN-107848947-A Fluorochemical, living polymerization initiator, fluoropolymer, the manufacture method of fluoropolymer and anti-corrosion agent composition DIC株式会社 2018-03-27 CN disclosed
CN-105348667-B Electroconductive polymer dispersion liquid, electroconductive polymer and application thereof 帝化株式会社 2018-01-23 CN disclosed
US-20170025227-A1 CONDUCTIVE POLYMER DISPERSION LIQUID, A CONDUCTIVE POLYMER, AND USE THEREOF TAYCA CORPORATION (JP) 2017-01-26 US disclosed
US-9460860-B2 Dispersion of electrically conductive polymer, and electrically conductive polymer and use thereof TAYCA CORPORATION (JP) 2016-10-04 US disclosed
CN-103748164-B Conductive polymer dispersion, conductive polymer, and use thereof 帝化株式会社 2016-09-14 CN disclosed
CN-105348667-A Dispersion of electrically conductive polymer, and electrically conductive polymer and use thereof TAYCA CORP 2016-02-24 CN disclosed
CN-104549371-A Catalyst of preparing isophorone by condensation of acetone and preparation method of catalyst CHINA PETROLEUM & CHEMICAL 2015-04-29 CN disclosed
CN-102791820-B Adhesive composition, use thereof, connection structure of circuit member, and method for producing connection structure of circuit member HITACHI CHEMICAL CO LTD 2015-04-29 CN disclosed
US-20140211374-A1 DISPERSION OF ELECTRICALLY CONDUCTIVE POLYMER, AND ELECTRICALLY CONDUCTIVE POLYMER AND USE THEREOF TAYCA CORPORATION (JP) 2014-07-31 US disclosed
CN-103748164-A Conductive polymer dispersion, conductive polymer, and use thereof TAYCA CORP 2014-04-23 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
CN-1161398-C Process for preparing spinning polyamide 6 因万塔-费希尔股份公司 2004-08-11 CN disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
CN-1091778-C Weather-resistant polyamides and method of their production INVENTA AG (CH) 2002-10-02 CN disclosed
CN-1259533-A Process for preparing spinning polyamide 6 INVENTIO FISHER CO LTD (CH) 2000-07-12 CN disclosed
CN-1173509-A Weather-resistant polyamides and method of their production INVENTA AG (CH) 1998-02-18 CN disclosed