Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.73 |
| ▸ | LMNA | P02545 | 2/20 | 0.62 |
| ▸ | TSHR | P16473 | 6/20 | 0.59 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.59 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.59 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.55 |
| ▸ | CAMK2A | Q9UQM7 | 1/20 | 0.53 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.52 |
| ▸ | PPARG | P37231 | 6/20 | 0.52 |
| ▸ | PPARD | Q03181 | 6/20 | 0.52 |
| ▸ | PPARA | Q07869 | 6/20 | 0.52 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | TLR2 | O60603 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | FABP4 | P15090 | 2/20 | 0.52 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.52 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | ESR1 | P03372 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Glutarate SCHEMBL5874406 | 1.00 | SLC22A6 (0.73) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Adipic Acid SCHEMBL5874870 | 0.93 | LMNA (0.73) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Adipic Acid SCHEMBL5874879 | 0.93 | LMNA (0.73) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Sebacic Acid SCHEMBL5874987 | 0.90 | TSHR (0.75) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Trimethylammonium SCHEMBL11145139 | 0.90 | TSHR (0.75) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Pimelic Acid SCHEMBL27899346 | 0.90 | TSHR (0.75) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Sebacic Acid SCHEMBL5874992 | 0.90 | TSHR (0.75) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Azelaic Acid SCHEMBL17765551 | 0.90 | TSHR (0.75) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Succinic Acid SCHEMBL5875148 | 0.86 | EGLN1 (0.69) | SLC22A6LMNATSHRNFKB1PMP22 | |
| Succinic Acid SCHEMBL5875155 | 0.86 | EGLN1 (0.69) | SLC22A6LMNATSHRNFKB1PMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101058633-A | Environment-friendly type aqueous polyester resin and preparation method thereof | FOSHAN SANSHUI YINYANG RESIN C (CN) | 2007-10-24 | — | — | CN | claimed |
| WO-2023164877-A1 | FULLERENE DERIVATIVE AND PEROVSKITE SOLAR CELL | 宁德时代新能源科技股份有限公司 | 2023-09-07 | — | — | WO | disclosed |
| CN-103068807-A | Method for producing phenyl-substituted heterocyclic derivative by means of coupling method using a palladium compound | TEIJIN PHARMA LTD | 2013-04-24 | — | — | CN | disclosed |
| CN-101768256-A | Water-dispersed short oil polyester resin preparation method | TIANJIN XINLIHUA COLOR MATERIA | 2010-07-07 | — | — | CN | disclosed |
| CN-100355803-C | Amorphous polyesters as polymer matrices for chewing gum matrices | BASF AG (DE) | 2007-12-19 | — | — | CN | disclosed |
| CN-101058633-A | Environment-friendly type aqueous polyester resin and preparation method thereof | FOSHAN SANSHUI YINYANG RESIN C (CN) | 2007-10-24 | — | — | CN | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| CN-1830811-A | Coating liquid for forming bi-based dielectric thin film with paraelectric and bi-based dielectric thin film | TOKYO OHKA KOGYO CO LTD (JP) | 2006-09-13 | — | — | CN | disclosed |
| CN-1798788-A | Amorphous polyesters as polymer matrices for chewing gum matrices | BASF AG (DE) | 2006-07-05 | — | — | CN | disclosed |
| CN-1223633-C | Polyacetal resin composition | POLYPLASTICS CO (JP) | 2005-10-19 | — | — | CN | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| CN-1392195-A | Polyacetal resin composition | POLYPLASTICS CO (JP) | 2003-01-22 | — | — | CN | disclosed |