Sebacic Acid

Sebacic Acid

SCHEMBL5874987

CN(C)C.CN(C)C.O=C(O)CCCCCCCCC(=O)O

nearest known ligand 0.75

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.75
LMNA P02545 2/20 0.75
NFKB1 P19838 1/20 0.75
PMP22 Q01453 1/20 0.75
GPR84 Q9NQS5 8/20 0.65
PPARG P37231 7/20 0.65
PPARD Q03181 7/20 0.65
PPARA Q07869 7/20 0.65
HDAC11 Q96DB2 5/20 0.65
PTPN1 P18031 3/20 0.65
ALDH1A1 P00352 2/20 0.65
TLR2 O60603 2/20 0.65
TDP1 Q9NUW8 2/20 0.65
FABP4 P15090 2/20 0.65
FFAR1 O14842 2/20 0.65
FFAR4 Q5NUL3 2/20 0.65
SLC22A6 Q4U2R8 2/20 0.65
SLC22A8 Q8TCC7 1/20 0.65
MEN1 O00255 1/20 0.65
ESR1 P03372 1/20 0.65

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trimethylammonium SCHEMBL11145139 1.00 TSHR (0.75) TSHRLMNANFKB1PMP22GPR84
Azelaic Acid SCHEMBL17765551 1.00 TSHR (0.75) TSHRLMNANFKB1PMP22GPR84
Sebacic Acid SCHEMBL5874992 1.00 TSHR (0.75) TSHRLMNANFKB1PMP22GPR84
Pimelic Acid SCHEMBL27899346 1.00 TSHR (0.75) TSHRLMNANFKB1PMP22GPR84
Adipic Acid SCHEMBL5874870 0.97 LMNA (0.73) TSHRLMNANFKB1PMP22GPR84
Adipic Acid SCHEMBL5874879 0.97 LMNA (0.73) TSHRLMNANFKB1PMP22GPR84
Glutarate SCHEMBL5874406 0.90 SLC22A6 (0.73) TSHRLMNANFKB1PMP22GPR84
Glutarate SCHEMBL5874412 0.90 SLC22A6 (0.73) TSHRLMNANFKB1PMP22GPR84
Stearic Acid SCHEMBL5875134 0.89 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Nonanoate SCHEMBL5875371 0.89 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed