Aminobenzoic Acid

Aminobenzoic Acid

SCHEMBL5874995

CC[N+](CC)(CC)CC.Nc1ccc(C(=O)[O-])cc1

nearest known ligand 0.47

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Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.47
CYP1A2 P05177 2/20 0.47
CYP3A4 P08684 2/20 0.47
MAOA P21397 1/20 0.47
CA1 P00915 12/20 0.42
CA2 P00918 12/20 0.42
CYP2C9 P11712 1/20 0.42
TSHR P16473 1/20 0.42
CYP2C19 P33261 1/20 0.42
PDE4D Q08499 1/20 0.42
CYP19A1 P11511 1/20 0.41
MAPT P10636 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
ALDH1A1 P00352 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Terephthalic Acid SCHEMBL8100760 0.90 CA2 (0.50) LMNACA1CA2TSHRMAPT
Tetrapropylammonium SCHEMBL5874348 0.85 MAPT (0.45) LMNACYP1A2CYP3A4MAOACA1
Aminobenzoic Acid SCHEMBL586932 0.84 CA2 (0.48) LMNACYP1A2CYP3A4MAOACA1
Aminobenzoic Acid SCHEMBL5874998 0.82 ALDH1A1 (0.50) LMNACYP1A2CYP3A4MAOACA1
Paraben SCHEMBL3694462 0.82 CA1 (0.65) LMNACYP1A2CYP3A4CA1CA2
Terephthalic Acid SCHEMBL8670584 0.82 ALDH1A1 (0.50) CA1CA2TSHRRAB9AALDH1A1
Tetrabuthylammonium SCHEMBL5874480 0.82 MAPT (0.50) LMNACYP1A2CYP3A4MAOACA1
Aminobenzoic Acid SCHEMBL269265 0.81 CA2 (0.54) LMNACA1CA2
Aminobenzoic Acid SCHEMBL10995557 0.81 CA2 (0.54) LMNACA1CA2
Aminobenzoic Acid SCHEMBL2270342 0.81 CA2 (0.54) LMNACA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed