Sebacic Acid

Sebacic Acid

SCHEMBL5875166

CCN.O=C(O)CCCCCCCCC(=O)O

nearest known ligand 0.71

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.71
LMNA P02545 3/20 0.71
NFKB1 P19838 2/20 0.71
PMP22 Q01453 1/20 0.71
GPR84 Q9NQS5 7/20 0.70
PPARG P37231 7/20 0.70
PPARD Q03181 7/20 0.70
PPARA Q07869 7/20 0.70
HDAC11 Q96DB2 5/20 0.70
ALDH1A1 P00352 3/20 0.70
PTPN1 P18031 3/20 0.70
TLR2 O60603 2/20 0.70
TDP1 Q9NUW8 2/20 0.70
MEN1 O00255 2/20 0.70
FABP4 P15090 2/20 0.70
ALOX15 P16050 2/20 0.70
KMT2A Q03164 2/20 0.70
SLC22A6 Q4U2R8 1/20 0.70
SLC22A8 Q8TCC7 1/20 0.70
ESR1 P03372 1/20 0.70

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Azelaic Acid SCHEMBL29048653 1.00 TSHR (0.71) TSHRLMNANFKB1PMP22GPR84
Sebacic Acid SCHEMBL5875156 1.00 TSHR (0.71) TSHRLMNANFKB1PMP22GPR84
Adipic Acid SCHEMBL5874779 0.97 LMNA (0.69) TSHRLMNANFKB1PMP22GPR84
Adipic Acid SCHEMBL5874787 0.97 LMNA (0.69) TSHRLMNANFKB1PMP22GPR84
Heptanoate SCHEMBL5874770 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Palmitic Acid SCHEMBL6326052 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Octanoic Acid SCHEMBL5874261 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Dodecanoate SCHEMBL21145133 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Undecanoate SCHEMBL21145311 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD
Nonanoate SCHEMBL5875259 0.92 GPR84 (0.85) TSHRLMNAGPR84PPARGPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed