Malonic Acid

Malonic Acid

SCHEMBL5875306

O=C(O)CC(=O)O.OCCONOCCO

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.47
SRR Q9GZT4 1/20 0.47
CAMK2A Q9UQM7 1/20 0.32
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.32
FNTA P49354 1/20 0.31
FNTB P49356 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
CNR2 P34972 1/20 0.30
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Glycolic Acid SCHEMBL1830773 0.90 LDHA (0.33) LDHASRRCAMK2ATSHRMAPK1
Bicarbonate SCHEMBL1832825 0.89 TSHR (0.35) LDHASRRTSHRMAPK1MEN1
Succinic Acid SCHEMBL1832871 0.87 EGLN1 (0.45) CAMK2ATSHRMAPK1
Oxalic Acid SCHEMBL1401648 0.86 TSHR (0.33) TSHRMAPK1MEN1KMT2ACNR2
Propionic Acid SCHEMBL1830527 0.85 FFAR3 (0.48) LDHASRRTSHRCNR2TRPV1
Chloroacetic Acid SCHEMBL5874438 0.85 TSHR (0.48) LDHASRRTSHR
Propionic Acid SCHEMBL29148406 0.85 FFAR3 (0.48) LDHASRRTSHRCNR2TRPV1
Carbamic Acid SCHEMBL9588667 0.84 ACHE (0.37) TSHRMAPK1MEN1KMT2ACNR2
Acetic Acid SCHEMBL502770 0.84 FFAR3 (0.37) TSHRMAPK1MEN1KMT2ACNR2
Glutarate SCHEMBL5874430 0.83 SLC22A6 (0.50) CAMK2ATSHRKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed