SCHEMBL5875331

SCHEMBL5875331

O=C(ON1CCCCC1)c1cc(O)c(O)c(O)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 11/20 0.49
POLB P06746 2/20 0.48
KDM4E B2RXH2 2/20 0.48
LMNA P02545 2/20 0.48
FUT7 Q11130 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
GAA P10253 1/20 0.48
NFKB1 P19838 1/20 0.48
XDH P47989 1/20 0.48
GFER P55789 1/20 0.48
NFKB2 Q00653 1/20 0.48
RELA Q04206 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
POLA1 P09884 1/20 0.42
ANTXR2 P58335 1/20 0.42
NSD2 O96028 1/20 0.42
CA12 O43570 1/20 0.41
ALDH1A1 P00352 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5874975 0.83 POLB (0.46) SERPINE1POLBKDM4ELMNAFUT7
SCHEMBL383557 0.79 SNCA (0.41) KDM4ELMNAALDH1A1MAPTHPGD
SCHEMBL28988328 0.79 ALDH1A1 (0.48) ALDH1A1MAPTHPGDMAPK1SMN1; SMN2
SCHEMBL8992905 0.76 KMT2A (0.55) TDP1GAACA12ALDH1A1CA1
SCHEMBL10388157 0.76 NPC1 (0.34) KDM4EGAAALDH1A1MAPTHPGD
SCHEMBL8993267 0.75 ALDH1A1 (0.53) KDM4ENFKB1NFKB2RELACA12
SCHEMBL1249246 0.74 HPGD (0.53) LMNAGAAGFERL3MBTL1ALDH1A1
SCHEMBL28495717 0.74 HPGD (0.53) LMNAGAAGFERL3MBTL1ALDH1A1
SCHEMBL5062317 0.73 ALDH1A1 (0.53) POLBLMNAGAAL3MBTL1ALDH1A1
SCHEMBL9861419 0.73 ALDH1A1 (0.53) POLBLMNAGAAL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed