Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 5/20 | 0.60 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.51 |
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 3/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | P4HB | P07237 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL72362 | 0.94 | ELANE (0.61) | ELANEKMT2AATMTDP1LMNA | |
| SCHEMBL217004 | 0.89 | ELANE (0.56) | ELANEKMT2AATMLMNAMAPT | |
| Hydroquinone SCHEMBL28395727 | 0.88 | ELANE (0.64) | ELANEKMT2AATMHTTTDP1 | |
| Anthraquinone SCHEMBL17448113 | 0.88 | ELANE (0.56) | ELANEKMT2AATMHTTTDP1 | |
| SCHEMBL27243146 | 0.87 | ELANE (0.54) | ELANEKMT2AATMHTTTDP1 | |
| SCHEMBL56436 | 0.86 | ELANE (0.69) | ELANEKMT2AATMHTTTDP1 | |
| SCHEMBL19985115 | 0.86 | ELANE (0.76) | ELANEKMT2AATMHTTLMNA | |
| Methacrylic Acid SCHEMBL28515155 | 0.85 | ELANE (0.60) | ELANEKMT2AATMHTTTDP1 | |
| Methacrylic Acid SCHEMBL28500482 | 0.85 | ELANE (0.69) | ELANEKMT2AATMTDP1MAPT | |
| Methacrylic Acid SCHEMBL2036071 | 0.85 | ELANE (0.69) | ELANEKMT2AATMTDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106414531-A | Curable composition, cured product thereof, molded article, and display member | DIC株式会社 | 2017-02-15 | — | — | CN | disclosed |
| US-9335632-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-10 | — | — | US | disclosed |
| US-9244350-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9063413-B2 | Resist composition, patterning process, monomer, and copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9052593-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9023586-B2 | Positive resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150064626-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20140170563-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20130323646-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-05 | — | — | US | disclosed |
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | RER1, SEM1, REV1 | ELANE 1402/4885KMT2A 1126/4885ATM 3734/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.