Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.45 |
| ▸ | ABAT | P80404 | 1/20 | 0.45 |
| ▸ | APP | P05067 | 2/20 | 0.42 |
| ▸ | TGM2 | P21980 | 1/20 | 0.42 |
| ▸ | CRHBP | P24387 | 1/20 | 0.40 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.40 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.40 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.38 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.37 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.37 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.37 |
| ▸ | CDK12 | Q9NYV4 | 4/20 | 0.37 |
| ▸ | CCNK | O75909 | 3/20 | 0.37 |
| ▸ | ESRRG | P62508 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10362074 | 0.86 | ALDH1A1 (0.48) | APPTGM2ALDH1A1KDM4EMAPT | |
| SCHEMBL7267715 | 0.84 | ALDH1A1 (0.46) | TGM2ALDH1A1MAPTSMN1; SMN2LMNA | |
| SCHEMBL10194675 | 0.82 | BCL2A1 (0.49) | TGM2CDK12CCNKALDH1A1MAPT | |
| SCHEMBL10194673 | 0.82 | BCL2A1 (0.49) | APPTGM2KDM4EMAPTSMN1; SMN2 | |
| SCHEMBL319608 | 0.82 | KMT2A (0.46) | ALDH1A1KDM4EMAPTSMN1; SMN2LMNA | |
| SCHEMBL8446378 | 0.81 | CYP2A6 (0.53) | ALDH5A1ABATTGM2CDK12CCNK | |
| SCHEMBL18229042 | 0.81 | NPC1 (0.47) | TGM2CDK12CCNKALDH1A1MAPT | |
| Water SCHEMBL11228979 | 0.81 | TGM2 (0.40) | TGM2CDK12CCNKALDH1A1MAPT | |
| SCHEMBL9133281 | 0.81 | NPC1 (0.47) | TGM2CDK12CCNKALDH1A1KDM4E | |
| Water SCHEMBL11223771 | 0.81 | TGM2 (0.40) | TGM2CDK12CCNKALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118355112-A | Hydrogel particles as feeder cells and as synthetic antigen presenting cells | 弹弓生物科学公司 | 2024-07-16 | — | — | CN | disclosed |
| EP-2866093-A1 | Anti-reflective coating forming composition containing vinyl ether compound and polyimide | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2015-04-29 | — | — | EP | disclosed |
| CN-102981368-B | Antireflective film-forming composition containing vinyl ether compound | NISSAN CHEMICAL IND LTD | 2015-03-04 | — | — | CN | disclosed |
| US-8501393-B2 | Lithography; photoresists; semiconductors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| EP-2592476-A1 | Antireflective coating forming composition containing vinyl ether compound and polyimide | Nissan Chemical Industries, Ltd. (JP) | 2013-05-15 | — | — | EP | disclosed |
| CN-102981368-A | Antireflective film-forming composition containing vinyl ether compound | NISSAN CHEMICAL INDUSTRY LTD | 2013-03-20 | — | — | CN | disclosed |
| CN-1954265-B | Composition for forming antireflection film containing vinyl ether compound | NISSAN CHEMICAL IND LTD | 2013-03-20 | — | — | CN | disclosed |
| EP-1577330-B1 | Copolymer, image-forming composition and plate for lithography | OKAMOTO CHEMICAL INDUSTRY CO LTD (JP) | 2012-02-15 | — | — | EP | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| CN-1954265-A | Composition for forming antireflection film containing vinyl ether compound | NISSAN CHEMICAL IND LTD (JP) | 2007-04-25 | — | — | CN | disclosed |
| EP-1757987-A1 | ANTIREFLECTIVE FILM-FORMING COMPOSITION CONTAINING VINYL ETHER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1577330-A1 | Copolymer, image-froming composition and plate for lithography | Okamoto Chemical Industry Co., Ltd (JP) | 2005-09-21 | — | — | EP | disclosed |
| US-20050042546-A1 | Base plate for lithographic printing plate | OKAMOTO CHEMICAL INDUSTRY CO. LTD. | 2005-02-24 | — | — | US | disclosed |
| EP-0184044-B1 | LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-01-15 | — | — | EP | disclosed |
| US-4699867-A | Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-10-13 | — | — | US | disclosed |
| EP-0184044-A2 | Light-sensitive composition, registration material prepared thereof, and process for obtaining heat-resistant relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-06-11 | — | — | EP | disclosed |