SCHEMBL5882013

SCHEMBL5882013

CCCCOc1ccc2cc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c3ccc(C)cc3C)ccc2c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF3 O95398 1/20 0.47
PDIA6 Q15084 1/20 0.43
CA12 O43570 3/20 0.37
CA1 P00915 3/20 0.37
CA9 Q16790 3/20 0.37
CA2 P00918 2/20 0.37
CA7 P43166 2/20 0.37
TSHR P16473 2/20 0.37
MAPT P10636 2/20 0.37
POLB P06746 2/20 0.37
MEN1 O00255 1/20 0.37
ALDH1A1 P00352 1/20 0.37
BLM P54132 1/20 0.37
KMT2A Q03164 1/20 0.37
MMP9 P14780 1/20 0.35
MMP13 P45452 1/20 0.35
ADAM17 P78536 1/20 0.35
RAPGEF4 Q8WZA2 1/20 0.34
CA3 P07451 1/20 0.34
CA4 P22748 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5882011 0.97 RAPGEF3 (0.45) RAPGEF3PDIA6CA12CA1CA9
SCHEMBL6737115 0.88 PDIA6 (0.41) PDIA6CA12CA1CA9CA2
SCHEMBL5881983 0.88 RAPGEF3 (0.39) RAPGEF3PDIA6CA12CA1CA9
SCHEMBL6741894 0.88 PDIA6 (0.41) PDIA6CA12CA1CA9CA2
SCHEMBL5881831 0.88 CA12 (0.47) RAPGEF3CA12CA1CA9CA2
SCHEMBL5881824 0.86 PTPN11 (0.40) RAPGEF3PDIA6TSHRMEN1ALDH1A1
SCHEMBL5882063 0.85 CA12 (0.44) CA12CA1CA9CA2CA7
SCHEMBL6741158 0.85 PDIA6 (0.54) PDIA6CA12CA1CA9CA2
SCHEMBL5881861 0.84 THRA (0.46) CA12CA1CA9CA2CA7
SCHEMBL5881612 0.84 THRA (0.46) CA12CA1CA9CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7056640-B2 Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-06-06 US disclosed
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040033432-A1 Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process POLL, PIM3, VEGFA RAPGEF3 1534/4885PDIA6 2158/4885CA12 2701/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.