Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | HMGCR | P04035 | 3/20 | 0.34 |
| ▸ | PTPN7 | P35236 | 5/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | BLM | P54132 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2121918 | 0.92 | PTPN7 (0.40) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL9628541 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL3796995 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL3796992 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL31519146 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL9336077 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL5865499 | 0.90 | PTPN7 (0.43) | TSHRHMGCRPTPN7KDM4EMEN1 | |
| SCHEMBL16420274 | 0.85 | RAB9A (0.33) | LMNA | |
| Oxalic Acid SCHEMBL5367389 | 0.83 | HMGCR (0.38) | HMGCRPTPN7KDM4EMEN1USP2 | |
| SCHEMBL734583 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11814462-B2 | Functionalized cyclic polymers and methods of preparing same | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2023-11-14 | — | — | US | claimed |
| US-20220056167-A1 | Functionalized Cyclic Polymers and Methods of Preparing Same | NATIONAL SCIENCE FOUNDATION | 2022-02-24 | — | — | US | claimed |
| WO-2020223672-A1 | FUNCTIONALIZED CYCLIC POLYMERS AND METHODS OF PREPARING SAME | UNIVERSITY OF FLORIDA RESEARCHFOUNDATION, INC. (US) | 2020-11-05 | — | — | WO | claimed |
| US-6436824-B1 | Low dielectric constant materials for copper damascene | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2002-08-20 | — | — | US | claimed |
| US-11814462-B2 | Functionalized cyclic polymers and methods of preparing same | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2023-11-14 | — | — | US | disclosed |
| US-20220056167-A1 | Functionalized Cyclic Polymers and Methods of Preparing Same | NATIONAL SCIENCE FOUNDATION | 2022-02-24 | — | — | US | disclosed |
| WO-2020223672-A1 | FUNCTIONALIZED CYCLIC POLYMERS AND METHODS OF PREPARING SAME | UNIVERSITY OF FLORIDA RESEARCHFOUNDATION, INC. (US) | 2020-11-05 | — | — | WO | disclosed |
| EP-2085220-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same | FUJIFILM CORP (JP) | 2015-05-20 | — | — | EP | disclosed |
| US-8816114-B2 | Method for manufacturing ruthenium carbene complexes | EVONIK DEGUSSA GMBH (DE) | 2014-08-26 | — | — | US | disclosed |
| US-20130338370-A1 | METHOD FOR MANUFACTURING RUTHENIUM CARBENE COMPLEXES | EVONIK DEGUSSA GMBH (DE) | 2013-12-19 | — | — | US | disclosed |
| WO-2013159135-A1 | DISPERSION INK | SEPIAX INK TECHNOLOGY GMBH (AT) | 2013-10-31 | — | — | WO | disclosed |
| US-8501975-B2 | Method for manufacturing ruthenium carbene complexes | EVONIK DEGUSSA GMBH (DE) | 2013-08-06 | — | — | US | disclosed |
| US-6887649-B2 | Multi-layered resist structure and manufacturing method of semiconductor device | FUJITSU LIMITED (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20030225232-A1 | Hyperbranched polymers | HONG KONG UNIVERSITY OF SCIENCE & TECHNOLOGY, THE (HK) | 2003-12-04 | — | — | US | disclosed |
| US-20030035917-A1 | Image making medium | HYMAN SYDNEY (US) | 2003-02-20 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020192595-A1 | Multi-layered resist structure and manufacturing method of semiconductor device | FUJITSU LIMITED (JP) | 2002-12-19 | — | — | US | disclosed |
| US-6436824-B1 | Low dielectric constant materials for copper damascene | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2002-08-20 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |