Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.40 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.39 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP13 | P45452 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14393959 | 0.85 | AR (0.41) | ARCYP1A2CYP2A6ALDH1A1LMNA | |
| SCHEMBL13386343 | 0.84 | AR (0.49) | ARTDP1CYP1A2ALDH1A1GAA | |
| SCHEMBL13915410 | 0.83 | AR (0.45) | ARALDH1A1MEN1KMT2AACHE | |
| SCHEMBL5887695 | 0.81 | TSHR (0.43) | ARPOLBTDP1CYP1A2CYP2A6 | |
| SCHEMBL25517553 | 0.78 | CA12 (0.41) | POLBTDP1AKR1B1PTGDR2ALDH1A1 | |
| SCHEMBL15986534 | 0.78 | LMNA (0.40) | POLBTDP1AKR1B1PTGDR2ALDH1A1 | |
| SCHEMBL16326824 | 0.78 | AR (0.45) | ARAKR1B1PTGDR2GAACYP2C9 | |
| SCHEMBL11192792 | 0.78 | NR1H2 (0.52) | ARPOLBTDP1ALDH1A1GAA | |
| SCHEMBL9486952 | 0.77 | POLB (0.40) | POLBTDP1AKR1B1PTGDR2ALDH1A1 | |
| SCHEMBL9935610 | 0.77 | RAPGEF4 (0.43) | ARTDP1CYP1A2CYP2A6ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115055927-B | Preparation method of high-strength high-temperature-resistant numerical control drill bit | 吉安富奇精密制造有限公司 | 2024-02-09 | — | — | CN | claimed |
| CN-115055927-A | Preparation method of high-strength high-temperature-resistant numerical control drill bit | 吉安富奇精密制造有限公司 | 2022-09-16 | — | — | CN | claimed |
| CN-117645540-A | Preparation method of chlorophenoxycarboxylate | 山东润博生物科技有限公司 | 2024-03-05 | — | — | CN | disclosed |
| CN-115055927-B | Preparation method of high-strength high-temperature-resistant numerical control drill bit | 吉安富奇精密制造有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-115055927-A | Preparation method of high-strength high-temperature-resistant numerical control drill bit | 吉安富奇精密制造有限公司 | 2022-09-16 | — | — | CN | disclosed |
| EP-2784055-A1 | Fluoroform synthesis and uses thereof in the preparation of trifluoromethylated compounds | Institut National des Sciences Appliquées de Rouen (INSA) (FR) | 2014-10-01 | — | — | EP | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-20090045552-A1 | Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same | IMAI GENJI | 2009-02-19 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7338740-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20070259279-A1 | Near Infrared Ray Activation Type Positive Resin Composition | KANSAI PAINT CO., LTD. (JP) | 2007-11-08 | — | — | US | disclosed |
| US-7279265-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-7250246-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-07-31 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7112697-B1 | Methods for formation of aryl-sulfur and aryl-selenium compounds using copper(I) catalysts | UNIVERSITY OF MASSACHUSETTS (US) | 2006-09-26 | — | — | US | disclosed |