Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL56243 | 0.82 | GABRA1 (0.44) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL50011 | 0.82 | ALDH1A1 (0.44) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL6281523 | 0.82 | ALDH1A1 (0.44) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL29364896 | 0.82 | ALDH1A1 (0.44) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL29717597 | 0.82 | GABRA1 (0.44) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL1507296 | 0.80 | ALDH1A1 (0.48) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL640982 | 0.80 | ALDH1A1 (0.43) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL5072506 | 0.80 | ALDH1A1 (0.43) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL2064114 | 0.78 | ALDH1A1 (0.41) | ALDH1A1GABRA1GABRB2TSHR | |
| SCHEMBL9772094 | 0.78 | ALDH1A1 (0.41) | ALDH1A1GABRA1GABRB2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7026372-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |