Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 6/20 | 0.48 |
| ▸ | MAOB | P27338 | 6/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | EGFR | P00533 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | PARP1 | P09874 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7990104 | 0.85 | MAOA (0.56) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL809311 | 0.80 | MAOA (0.52) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL7984999 | 0.80 | MAOA (0.52) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL7986401 | 0.80 | MAOA (0.52) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL1005574 | 0.78 | MAOA (0.50) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL7217517 | 0.78 | L3MBTL1 (0.54) | MAOAMAOBMAPTLMNATDP1 | |
| SCHEMBL1536703 | 0.78 | MAOA (0.56) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL952229 | 0.78 | MAOA (0.50) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL810101 | 0.76 | MAOA (0.48) | MAOAMAOBMAPTPOLBLMNA | |
| SCHEMBL2064112 | 0.76 | MAOA (0.48) | MAOAMAOBMAPTPOLBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7026372-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |