SCHEMBL5898753

SCHEMBL5898753

Cl[Si](Cl)(Cl)CCP(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
KDM4E B2RXH2 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11347989 0.84 CYP3A4 (0.31) CYP3A4TDP1
SCHEMBL10384104 0.83 CYP3A4 (0.33) CYP3A4TDP1
SCHEMBL11044528 0.81 CYP3A4 (0.39) CYP3A4TDP1KDM4EGAA
SCHEMBL9806656 0.78 CYP3A4 (0.45) CYP3A4TDP1KDM4EGAA
SCHEMBL10595565 0.78 CYP3A4 (0.45) CYP3A4TDP1KDM4EGAA
SCHEMBL10709552 0.77 CYP3A4 (0.36) CYP3A4TDP1KDM4EGAA
SCHEMBL11044338 0.77 CYP3A4 (0.36) CYP3A4TDP1KDM4EGAA
SCHEMBL10728260 0.77 CYP3A4 (0.36) CYP3A4TDP1KDM4EGAA
SCHEMBL17431935 0.77 CYP3A4 (0.36) CYP3A4TDP1KDM4EGAA
SCHEMBL27343 0.77 CYP3A4 (0.50) CYP3A4TDP1KDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040265600-A1 Material for forming copper undercoat films TRI CHEMICAL LABORATORY, INC. (JP) 2004-12-30 US claimed
US-7022606-B2 Underlayer film for copper, and a semiconductor device including the underlayer film MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-04-04 US disclosed
US-20040265600-A1 Material for forming copper undercoat films TRI CHEMICAL LABORATORY, INC. (JP) 2004-12-30 US disclosed
US-20040137726-A1 Underlayer film-forming material for copper, method for a forming underlayer film for copper, an underlayer film for copper, and a semiconductor device MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2004-07-15 US disclosed
EP-0291149-A2 A luminescent chemical sensor for gases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-11-17 EP disclosed
US-4752588-A Luminescent chemical sensor for gases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-06-21 US disclosed
US-4268682-A ω-Alkenyl silanes and αω-silyl alkanes EXXON RESEARCH & ENGINEERING CO. (US) 1981-05-19 US disclosed
US-4220556-A HETEROGENEOUS CATALYST COVALENTLY ANCHORED TO CATALYST SUPPORT EXXON RESEARCH & ENGINEERING CO. (US) 1980-09-02 US disclosed
US-4151114-A ANCHORED CATALYSTS EXXON RESEARCH & ENGINEERING CO. (US) 1979-04-24 US disclosed
US-4134906-A Silylhydrocarbyl phosphine transition metal complexes EXXON RESEARCH & ENGINEERING CO. (US) 1979-01-16 US disclosed
US-4083803-A Anchored silylhydrocarbyl phosphine transition metal complex catalysts and their method of preparation EXXON RESEARCH & ENGINEERING CO. (US) 1978-04-11 US disclosed