SCHEMBL5907902

SCHEMBL5907902

Cc1cc(OC(=O)OC(C)(C)C)ccc1C(c1ccc(OC(=O)OC(C)(C)C)cc1C)c1ccc(OC(=O)OC(C)(C)C)cc1C

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.53
CA2 P00918 1/20 0.42
TDP1 Q9NUW8 3/20 0.41
PLA2G1B P04054 1/20 0.41
ATG4B Q9Y4P1 1/20 0.41
KDM1A O60341 1/20 0.40
NPC1 O15118 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MAPT P10636 2/20 0.33
MAPKAPK2 P49137 1/20 0.33
ACHE P22303 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GLA P06280 1/20 0.33
GAA P10253 1/20 0.33
HPGD P15428 1/20 0.33
FKBP1A P62942 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27686098 0.83 ELANE (0.59) ELANECA2TDP1KDM1ANPC1
SCHEMBL9176411 0.82 ELANE (0.44) ELANECA2TDP1PLA2G1BATG4B
SCHEMBL4622585 0.81 ELANE (0.56) ELANECA2TDP1KDM1AL3MBTL1
SCHEMBL2540263 0.81 ELANE (0.56) ELANECA2TDP1KDM1ANPC1
SCHEMBL17355754 0.79 ELANE (0.54) ELANECA2TDP1KDM1ANPC1
SCHEMBL9180610 0.79 ELANE (0.42) ELANECA2TDP1PLA2G1BATG4B
SCHEMBL4061539 0.78 ELANE (0.65) ELANECA2TDP1KDM1AL3MBTL1
SCHEMBL4061370 0.77 ELANE (0.81) ELANECA2TDP1KDM1AL3MBTL1
SCHEMBL10356768 0.76 ELANE (0.50) ELANECA2TDP1KDM1ANPC1
SCHEMBL16785668 0.75 ELANE (0.53) ELANECA2TDP1KDM1ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060194143-A1 Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process CENTRAL GLASS COMPANY, LIMITED (JP) 2006-08-31 US disclosed
US-20060183051-A1 Positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-08-17 US disclosed