Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | RXRA | P19793 | 1/20 | 0.33 |
| ▸ | RXRB | P28702 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31695400 | 1.00 | ALDH1A1 (0.50) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Water SCHEMBL29908361 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Water SCHEMBL104768 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Iodide SCHEMBL6927732 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL5065183 | 0.91 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL3407049 | 0.89 | GABRA1 (0.47) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL31005118 | 0.85 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL3200821 | 0.85 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL3215140 | 0.85 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL31005109 | 0.85 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114414711-B | Identification method of onium salt photoacid generator in photoresist | 北京彤程创展科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-114414711-A | Method for identifying onium salt type photoacid generator in photoresist | 北京彤程创展科技有限公司 | 2022-04-29 | — | — | CN | claimed |
| EP-3152620-B1 | PASSIVATION LAYER COMPRISING A PHOTOCROSSLINKED FLUOROPOLYMER | CHEMOURS CO FC LLC (US) | 2018-08-01 | — | — | EP | claimed |
| US-8980538-B2 | Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents | TOKYO ELECTRON LIMITED (JP) | 2015-03-17 | — | — | US | claimed |
| WO-2014158440-A2 | CHEMI-EPITAXY IN DIRECTED SELF-ASSEMBLY APPLICATIONS USING PHOTO-DECOMPOSABLE AGENTS | TOKYO ELECTRON LIMITED (JP) | 2014-10-02 | — | — | WO | claimed |
| US-20140272723-A1 | CHEMI-EPITAXY IN DIRECTED SELF-ASSEMBLY APPLICATIONS USING PHOTO-DECOMPOSABLE AGENTS | TOKYO ELECTRON LIMITED (JP) | 2014-09-18 | — | — | US | claimed |
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| EP-1466215-A1 | NEGATIVE DEEP ULTRAVIOLET PHOTORESIST | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | claimed |
| US-6800416-B2 | MIXTURE OF FLUOROPOLYMER, PHOTOACTIVE MATERIAL AND CROSSLINKING AGENT | CLARIANT FINANCE (BVI) LTD. (VG) | 2004-10-05 | — | — | US | claimed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | claimed |
| WO-2003058347-A1 | NEGATIVE DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129527-A1 | Negative deep ultraviolet photoresist | AZ ELECTRONIC MATERIALS USA CORP. | 2003-07-10 | — | — | US | claimed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | claimed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | claimed |
| EP-0136679-B1 | PHOTOPOLYMERIZABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-12-16 | — | — | EP | claimed |