SCHEMBL5065183

SCHEMBL5065183

CC(C)(C)c1ccccc1[S+](c1ccccc1C(C)(C)C)c1ccccc1C(C)(C)C.F[B-](F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
TSHR P16473 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
CA2 P00918 1/20 0.39
GABRA1 P14867 1/20 0.34
GABRB2 P47870 1/20 0.34
KIF11 P52732 1/20 0.33
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33
GRIN3A Q8TCU5 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
POLB P06746 2/20 0.32
GAA P10253 2/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31695400 0.91 ALDH1A1 (0.50) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL59268 0.91 ALDH1A1 (0.50) ALDH1A1TSHRTDP1CA2GABRA1
Water SCHEMBL104768 0.88 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2GABRA1
Water SCHEMBL29908361 0.88 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2GABRA1
Iodide SCHEMBL6927732 0.88 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL1477598 0.81 ALDH1A1 (0.35) ALDH1A1TSHRTDP1CA2
SCHEMBL30248741 0.81 ALDH1A1 (0.35) ALDH1A1TSHRTDP1CA2
SCHEMBL3407049 0.80 GABRA1 (0.47) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL3215140 0.77 ALDH1A1 (0.43) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL31005118 0.77 ALDH1A1 (0.43) ALDH1A1TSHRTDP1CA2GABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1516230-B1 PHOTOSENSITIVE COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS (US) 2015-12-30 EP disclosed
EP-1516230-A4 PHOTOSENSITIVE COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS (US) 2008-01-02 EP disclosed
US-6911297-B2 Photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-06-28 US disclosed
EP-1299774-A4 PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS ARCH SPEC CHEM INC (US) 2005-06-08 EP disclosed
EP-1516230-A2 PHOTOSENSITIVE COMPOSITIONS Arch Specialty Chemicals, Inc. (US) 2005-03-23 EP disclosed
US-6855476-B2 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-02-15 US disclosed
US-20040072095-A1 Photoresist compositions ARCH SPECIALITY CHEMICAL, INC. 2004-04-15 US disclosed
WO-2004002955-A2 PHOTOSENSITIVE COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2004-01-08 WO disclosed
EP-1299774-A1 PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-09 EP disclosed
US-20020197558-A1 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2002-12-26 US disclosed
WO-2002082185-A1 PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS ARCH SPECIALTY CHEMICALS, INC. (US) 2002-10-17 WO disclosed