Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS1 | P29475 | 3/20 | 0.43 |
| ▸ | NOS3 | P29474 | 2/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.39 |
| ▸ | PARP4 | Q9UKK3 | 2/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.39 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.39 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.39 |
| ▸ | PARP1 | P09874 | 1/20 | 0.39 |
| ▸ | PARP2 | Q9UGN5 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28379021 | 0.89 | CES2 (0.50) | NOS1NOS3CA1CA2ALDH1A1 | |
| SCHEMBL28382081 | 0.89 | LMNA (0.50) | CA1CA2MAPTKMT2AHPGD | |
| SCHEMBL28377559 | 0.89 | MAPT (0.51) | NOS1CA1CA2MAPTKMT2A | |
| SCHEMBL4744665 | 0.87 | TSHR (0.54) | CYP19A1CA1CA2PARP1ESR1 | |
| SCHEMBL4744670 | 0.87 | TSHR (0.54) | CYP19A1CA1CA2PARP1ESR1 | |
| Ether SCHEMBL6260412 | 0.85 | PARP10 (0.44) | NOS1NOS3CYP19A1CA1CA2 | |
| SCHEMBL28379400 | 0.85 | CA1 (0.64) | CA1CA2PARP10PARP4PARP1 | |
| SCHEMBL28375643 | 0.85 | ALDH1A1 (0.52) | PARP10ALDH1A1L3MBTL1TDP1 | |
| SCHEMBL28380993 | 0.83 | CES2 (0.55) | MAPTALDH1A1 | |
| SCHEMBL28379414 | 0.77 | TSHR (0.63) | CA1CA2CA12CA9MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1018 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040063034-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | claimed |
| EP-1403041-A2 | Infrared-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-31 | — | — | EP | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| EP-0399755-B1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | FUJI PHOTO FILM CO LTD (JP) | 1994-03-30 | — | — | EP | claimed |
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | claimed |
| US-5112743-A | Aromatic-aldehyde diazo resins | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-12 | — | — | US | claimed |
| EP-0399755-A1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | Fuji Photo Film Co., Ltd. (JP) | 1990-11-28 | — | — | EP | claimed |
| WO-2023032868-A1 | ON-MACHINE DEVELOPMENT-TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR MANUFACTURING PRINTING PLATE | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-109952536-B | Radiation-sensitive composition, lithographic printing plate precursor, and method for making lithographic printing plate | 富士胶片株式会社 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022138880-A1 | LAMINATE OF NEGATIVE LITHOGRAPHIC PRINTING PLATE ORIGINAL PLATE AND METHOD FOR MANUFACTURING NEGATIVE LITHOGRAPHIC PRINTING PLATE | 富士フイルム株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| EP-2572243-B1 | POLYMERIZABLE COMPOSITION | FUJIFILM CORP (JP) | 2021-04-07 | — | — | EP | disclosed |
| WO-2020066377-A1 | LITHOGRAPHIC-PRINTING-PLATE ORIGINAL AND LITHOGRAPHIC-PRINTING-PLATE MANUFACTURING METHOD | 富士フイルム株式会社 | 2020-04-02 | — | — | WO | disclosed |
| EP-0377321-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-07-11 | — | — | EP | disclosed |
| US-4902604-A | CATIONIC AZULENE DERIVATIVE; PRINTING PLATES, RESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1990-02-20 | — | — | US | disclosed |
| US-4810618-A | HIGH SENSITIVITY, PRINTING PLATES, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1989-03-07 | — | — | US | disclosed |
| US-4772534-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1988-09-20 | — | — | US | disclosed |
| US-4737484-A | Heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1988-04-12 | — | — | US | disclosed |
| US-4636459-A | PHOTOINITIATOR AND UNSATURATED MONOMER; PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1987-01-13 | — | — | US | disclosed |
| US-4555474-A | IMPROVED PHOTOSENSITIVITY USING HETEROCYCLIC KETONE PHOTOINITIATORS; LITHOGRAPHY; PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1985-11-26 | — | — | US | disclosed |