⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Boric Acid SCHEMBL16245157 | 0.95 | — | — | |
| SCHEMBL10939481 | 0.80 | CA4 (0.39) | — | |
| SCHEMBL598512 | 0.79 | — | — | |
| Boric Acid SCHEMBL11048797 | 0.78 | CA4 (0.38) | — | |
| SCHEMBL503663 | 0.74 | CA1 (0.38) | — | |
| Boric Acid SCHEMBL16245295 | 0.74 | — | — | |
| SCHEMBL7680409 | 0.71 | HTR2A (0.31) | — | |
| SCHEMBL956498 | 0.71 | HTR2A (0.31) | — | |
| SCHEMBL1879917 | 0.71 | HTR2A (0.31) | — | |
| SCHEMBL10709566 | 0.71 | TRPV6 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8030425-B2 | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films | PROMERUS LLC (US) | 2011-10-04 | — | — | US | claimed |
| EP-1771491-B1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | PROMERUS LLC (US) | 2009-11-18 | — | — | EP | claimed |
| US-20090189277-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS FOR LOW STRESS, HIGH TEMPERATURE FILMS | PROMERUS LLC (US) | 2009-07-30 | — | — | US | claimed |
| EP-1771491-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | Promerus, LLC (US) | 2007-04-11 | — | — | EP | claimed |
| US-7022790-B2 | Photosensitive compositions based on polycyclic polymers | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2006-04-04 | — | — | US | claimed |
| WO-2006016925-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | PROMERUS LLC (US) | 2006-02-16 | — | — | WO | claimed |
| EP-1532486-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-05-25 | — | — | EP | claimed |
| US-20040039153-A1 | Photosensitive compositions based on polycyclic polymers | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2004-02-26 | — | — | US | claimed |
| WO-2004006020-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2004-01-15 | — | — | WO | claimed |
| US-8816485-B2 | Methods and materials useful for chip stacking, chip and wafer bonding | SUMITOMO BAKELITE CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120175721-A1 | Methods And Materials Useful For Chip Stacking, Chip And Wafer Bonding | PROMERUS LLC (US) | 2012-07-12 | — | — | US | disclosed |
| US-8120168-B2 | Methods and materials useful for chip stacking, chip and wafer bonding | PROMERUS LLC (US) | 2012-02-21 | — | — | US | disclosed |
| US-8114948-B2 | Photosensitive compositions based on polycyclic polymers | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8030425-B2 | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films | PROMERUS LLC (US) | 2011-10-04 | — | — | US | disclosed |
| US-7022790-B2 | Photosensitive compositions based on polycyclic polymers | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| WO-2006016925-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | PROMERUS LLC (US) | 2006-02-16 | — | — | WO | disclosed |
| US-20060020068-A1 | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films | PROMERUS, LLC | 2006-01-26 | — | — | US | disclosed |
| EP-1532486-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-05-25 | — | — | EP | disclosed |
| US-20040039153-A1 | Photosensitive compositions based on polycyclic polymers | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| WO-2004006020-A1 | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2004-01-15 | — | — | WO | disclosed |