Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 11/20 | 0.38 |
| ▸ | CA2 | P00918 | 11/20 | 0.38 |
| ▸ | CA12 | O43570 | 8/20 | 0.38 |
| ▸ | CA7 | P43166 | 8/20 | 0.38 |
| ▸ | CA13 | Q8N1Q1 | 8/20 | 0.38 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.33 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
| ▸ | TTR | P02766 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2901027 | 0.86 | CA12 (0.41) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2902290 | 0.86 | ALDH1A1 (0.42) | CA1CA2CA12CA7CA13 | |
| SCHEMBL4644024 | 0.82 | CA12 (0.30) | CA1CA2CA12 | |
| Toliodium SCHEMBL2902228 | 0.81 | TLR9 (0.38) | CA1CA2CA12CA7HDAC6 | |
| SCHEMBL1800652 | 0.81 | ALDH1A1 (0.38) | CA1CA2CA12CA7CA13 | |
| SCHEMBL4647402 | 0.81 | CA1 (0.36) | CA1CA2CA12CA7CA13 | |
| SCHEMBL4641729 | 0.81 | CA12 (0.36) | CA1CA2CA12CA7CA13 | |
| SCHEMBL4643178 | 0.81 | CA1 (0.32) | CA1CA2CA12CA7CA13 | |
| SCHEMBL11393462 | 0.79 | FAAH (0.39) | CA1CA2CA12CA7CA13 | |
| SCHEMBL1803564 | 0.79 | HDAC6 (0.39) | CA1CA2CA12HDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | claimed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | claimed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | claimed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20140193752-A1 | STABILIZED ACID AMPLIFIERS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2014-07-10 | — | — | US | disclosed |
| US-20140087309-A1 | OLEFIN-TRIGGERED ACID AMPLIFIERS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2014-03-27 | — | — | US | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-8501382-B1 | Acid amplifiers | THE RESEARCH FOUNDATION OF STATE UNIV. OF NEW YORK (US) | 2013-08-06 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| WO-2012135278-A2 | OLEFIN-TRIGGERED ACID AMPLIFIERS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2012-10-04 | — | — | WO | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | ARID2, RAD1, RAD51 | CA1 207/4885CA2 541/4885CA12 1521/4885 |
| US-20140087309-A1 | OLEFIN-TRIGGERED ACID AMPLIFIERS | ELOVL1, ALOX12, ALOX5 | CA1 895/4885CA2 1027/4885CA12 2180/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | CA1 71/4885CA2 222/4885CA12 438/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.