Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 2/20 | 0.31 |
| ▸ | HTR2C | P28335 | 2/20 | 0.31 |
| ▸ | HTR2B | P41595 | 2/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL956498 | 1.00 | HTR2A (0.31) | HTR2AHTR2CHTR2BRECQLCYP3A4 | |
| SCHEMBL5556834 | 1.00 | HTR2A (0.31) | HTR2AHTR2CHTR2BRECQLCYP3A4 | |
| SCHEMBL1879917 | 1.00 | HTR2A (0.31) | HTR2AHTR2CHTR2BRECQLCYP3A4 | |
| SCHEMBL10939471 | 0.88 | CYP3A4 (0.33) | HTR2CCYP3A4TDP1 | |
| SCHEMBL11048802 | 0.88 | CYP3A4 (0.33) | HTR2CCYP3A4TDP1 | |
| SCHEMBL17200747 | 0.87 | ACHE (0.40) | CYP3A4TDP1 | |
| SCHEMBL10709566 | 0.83 | TRPV6 (0.39) | HTR2AHTR2CHTR2BTDP1 | |
| SCHEMBL10939481 | 0.83 | CA4 (0.39) | CYP3A4TDP1 | |
| SCHEMBL36560 | 0.82 | ALDH1A1 (0.40) | HTR2CCYP3A4TDP1 | |
| Boric Acid SCHEMBL11048797 | 0.81 | CA4 (0.38) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20250282915-A1 | METHOD FOR FORMING CURED FILM, METHOD FOR MANUFACTURING IMPRINT MOLD SUBSTRATE, METHOD FOR MANUFACTURING IMPRINT MOLD, METHOD FOR MANUFACTURING RELIEF STRUCTURE, METHOD FOR FORMING PATTERN, METHOD FOR FORMING HARD MASK, METHOD FOR FORMING INSULATING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2025-09-11 | — | — | US | disclosed |
| US-11787976-B2 | Method of producing anisotropic conductive film and anisotropic conductive film | DEXERIALS CORPORATION (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11784154-B2 | Anisotropic conductive film and method of producing the same | DEXERIALS CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| WO-2023190168-A1 | CURED FILM FORMING METHOD, METHOD FOR MANUFACTURING SUBSTRATE FOR IMPRINT MOLD, METHOD FOR MANUFACTURING IMPRINT MOLD, METHOD FOR MANUFACTURING UNEVEN STRUCTURE, PATTERN FORMING METHOD, HARD MASK FORMING METHOD, INSULATING FILM FORMING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 大日本印刷株式会社 | 2023-10-05 | — | — | WO | disclosed |
| CN-116323720-A | Curable resin composition for silicon-containing resist, pattern forming method, method for producing imprint mold, and method for producing semiconductor device | 大日本印刷株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-109087900-B | Anisotropic conductive film and method for producing same | 迪睿合株式会社 | 2023-04-21 | — | — | CN | disclosed |
| CN-115702387-A | Method for manufacturing light emitting element | 中央硝子株式会社 | 2023-02-14 | — | — | CN | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| US-9585247-B2 | Anisotropic conductive film and method of producing the same | DEXERIALS CORPORATION (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160255724-A1 | ELECTRICAL CONNECTION MATERIAL | DEXERIALS CORPORATION (JP) | 2016-09-01 | — | — | US | disclosed |
| WO-2016136240-A1 | NANONIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING NANOIMPRINT LIQUID MATERIAL, METHOD FOR MANUFACTURING CURED PRODUCT PATTERN, METHOD FOR MANUFACTURING OPTICAL COMPONENT, AND METHOD FOR MANUFACTURING CIRCUIT BOARD | CANON KABUSHIKI KAISHA (JP) | 2016-09-01 | — | — | WO | disclosed |
| US-20160155717-A1 | ANISOTROPIC CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR | DEXERIALS CORPORATION (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20150271918-A1 | ANISOTROPIC CONDUCTIVE FILM AND METHOD OF PRODUCING THE SAME | DEXERIALS CORPORATION (JP) | 2015-09-24 | — | — | US | disclosed |
| US-20150231803-A1 | METHOD OF PRODUCING ANISOTROPIC CONDUCTIVE FILM AND ANISOTROPIC CONDUCTIVE FILM | DEXERIALS CORPORATION (JP) | 2015-08-20 | — | — | US | disclosed |
| US-20150214176-A1 | ANISOTROPIC CONDUCTIVE FILM AND METHOD OF PRODUCING THE SAME | DEXERIALS CORPORATION (JP) | 2015-07-30 | — | — | US | disclosed |
| US-6406770-B1 | MULTILAYER; CONTAINING CATIONIC POLYMER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2002-06-18 | — | — | US | disclosed |
| EP-1005037-A1 | OPTICAL DISK AND METHOD OF MANUFACTURING OPTICAL DISK | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2000-05-31 | — | — | EP | disclosed |
| US-4342673-A | CURABLE EPOXY PREPOLYMERS AND AN IODONIUM SALT | GENERAL ELECTRIC COMPANY (US) | 1982-08-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | HTR2A 1300/4885HTR2C 2284/4885HTR2B 2209/4885 |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | SMCHD1, PIM1, PIM2 | HTR2A 3052/4885HTR2C 3218/4885HTR2B 3634/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.