SCHEMBL599205

SCHEMBL599205

CC=C(C)C(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL437658 0.83 ALDH1A1 (0.31)
SCHEMBL30122614 0.83 ALDH1A1 (0.31)
SCHEMBL16504613 0.83 ALDH1A1 (0.31)
SCHEMBL1667270 0.83 ALDH1A1 (0.31)
SCHEMBL14715886 0.82 GAA (0.35)
Fluoride SCHEMBL29653653 0.81 ALDH1A1 (0.31)
SCHEMBL18260686 0.81 ALDH1A1 (0.32)
SCHEMBL28116438 0.80 THRB (0.34)
SCHEMBL28116060 0.80 THRB (0.34)
SCHEMBL424211 0.80 THRB (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8114467-B2 Polymer for forming hydrophobic layer, hydrophobic layer comprising the polymer and electronic article comprising the hydrophobic layer SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-02-14 US disclosed
US-20090191328-A1 POLYMER FOR FORMING HYDROPHOBIC LAYER, HYDROPHOBIC LAYER COMPRISING THE POLYMER AND ELECTRONIC ARTICLE COMPRISING THE HYDROPHOBIC LAYER SAMSUNG ELECTRONICS CO., LTD., (KR) 2009-07-30 US disclosed